Kyooho Jung
Kyooho Jung
Samsung Electronics; UIUC, Stanford Univ., Yonsei Univ.
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Citata da
Citata da
Anomalous modulation of a zero-bias peak in a hybrid nanowire-superconductor device
ADK Finck, DJ Van Harlingen, PK Mohseni, K Jung, X Li
Physical review letters 110 (12), 126406, 2013
Understanding self-aligned planar growth of InAs nanowires
Y Zi, K Jung, D Zakharov, C Yang
Nano letters 13 (6), 2786-2791, 2013
Effect of diameter variation on electrical characteristics of Schottky barrier indium arsenide nanowire field-effect transistors
A Razavieh, PK Mohseni, K Jung, S Mehrotra, S Das, S Suslov, X Li, ...
ACS nano 8 (6), 6281-6287, 2014
Ultrathin InAs nanowire growth by spontaneous Au nanoparticle spreading on indium-rich surfaces
K Jung, PK Mohseni, X Li
Nanoscale 6 (24), 15293-15300, 2014
Large area MoS2 van der Waals epitaxy on III-Ns and the epitaxial formation of a n-MoS2/p-InGaN diode
K Jung, CY Liu, JD Kim, W Choi, W Zhou, HC Kuo, X Li
2016 IEEE Photonics Conference (IPC), 657-658, 2016
Hybrid Integration of n-MoS2/p-GaN Diodes by Quasi-van der Waals Epitaxy
C Liu, H Huang, W Choi, J Kim, K Jung, W Sun, N Tansu, W Zhou, H Kuo, ...
ACS Applied Electronic Materials 2 (2), 419-425, 2020
Elastocapillary Force Induced Alignment of Large Area Planar Nanowires
K Jung, W Choi, HC Huang, JD Kim, K Chabak, X Li
ACS Applied Materials & Interfaces, 2021
Pseudo-Van Der Waals Epitaxy of MoS2 on Patterned and Planar GaN Substrates
C Liu, W Choi, H Huang, J Kim, K Jung, W Zhou, HC Kuo, X Li
2019 Conference on Lasers and Electro-Optics (CLEO), 1-2, 2019
Novel nanomanufacturing methods for bottom-up III-V nanowires and van der Waals epitaxy of monolayer MoS2
K Jung
University of Illinois at Urbana-Champaign, 2016
Hints of hybridizing Majorana fermions in a nanowire coupled to superconducting leads
ADK Finck, DJ Van Harlingen, PK Mohseni, K Jung, X Li
APS March Meeting Abstracts 2013, T13. 011, 2013
Scalable 3D III-V Nanowire Electronics by MOCVD
X Li, X Miao, C Zhang, KD Chabak, R Dowdy, P Mohseni, K Jung, W Choi, ...
Il sistema al momento non pu eseguire l'operazione. Riprova pi tardi.
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