| Electrical test structure and method for measuring the relative locations of conducting features on an insulating substrate M Cresswell, R Allen, L Linholm, M Gaitan US Patent 5,383,136, 1995 | 115 | 1995 |
| Traceable calibration of critical-dimension atomic force microscope linewidth measurements with nanometer uncertainty RG Dixson, RA Allen, WF Guthrie, MW Cresswell Journal of Vacuum Science & Technology B: Microelectronics and Nanometer …, 2005 | 106 | 2005 |
| Methods and test structures for measuring overlay in multilayer devices RA Allen, MW Cresswell US Patent 5,699,282, 1997 | 96 | 1997 |
| Electrical test structure and method for measuring the relative locations of conductive features on an insulating substrate WB Penzes, RA Allen, MW Cresswell, LW Linholm, EC Teague US Patent 5,857,258, 1999 | 95 | 1999 |
| Method and reference standards for measuring overlay in multilayer structures, and for calibrating imaging equipment as used in semiconductor manufacturing MW Cresswell, RA Allen, JJ Kopanski, LW Linholm US Patent 5,617,340, 1997 | 91 | 1997 |
| Overlay target and measurement procedure to enable self-correction for wafer-induced tool-induced shift by imaging sensor means MW Cresswell, LW Linholm, RA Allen US Patent 5,923,041, 1999 | 82 | 1999 |
| Electrical test structure and method for measuring the relative locations of conducting features on an insulating substrate MW Cresswell, LW Linholm, RA Allen, EC Teague, WB Penzes US Patent 5,602,492, 1997 | 75 | 1997 |
| CD-AFM reference metrology at NIST and SEMATECH R Dixson, J Fu, N Orji, W Guthrie, R Allen, M Cresswell Metrology, Inspection, and Process Control for Microlithography XIX 5752 …, 2005 | 60 | 2005 |
| RM 8111: Development of a prototype linewidth standard MW Cresswell, WF Guthrie, RG Dixson, RA Allen, CE Murabito, ... Journal of research of the National Institute of Standards and Technology …, 2006 | 58 | 2006 |
| Modeling and simulation of resistivity of nanometer scale copper AE Yarimbiyik, HA Schafft, RA Allen, ME Zaghloul, DL Blackburn Microelectronics Reliability 46 (7), 1050-1057, 2006 | 55 | 2006 |
| Intercomparison of SEM, AFM, and electrical linewidths JS Villarrubia, RG Dixson, SN Jones, JR Lowney, MT Postek Jr, RA Allen, ... Metrology, Inspection, and Process Control for Microlithography XIII 3677 …, 1999 | 46 | 1999 |
| Intercomparison of SEM, AFM, and electrical linewidths JS Villarrubia, RG Dixson, SN Jones, JR Lowney, MT Postek Jr, RA Allen, ... Metrology, Inspection, and Process Control for Microlithography XIII 3677 …, 1999 | 46 | 1999 |
| Fabrication and characterization of patterned single-crystal silicon nanolines B Li, MK Kang, K Lu, R Huang, PS Ho, RA Allen, MW Cresswell Nano letters 8 (1), 92-98, 2008 | 36 | 2008 |
| TEM calibration methods for critical dimension standards NG Orji, RG Dixson, DI Garcia-Gutierrez, BD Bunday, M Bishop, ... Metrology, Inspection, and Process Control for Microlithography XXI 6518 …, 2007 | 36 | 2007 |
| Metrology needs for through-silicon via fabrication V Vartanian, RA Allen, L Smith, K Hummler, S Olson, B Sapp Journal of Micro/Nanolithography, MEMS, and MOEMS 13 (1), 011206-011206, 2014 | 35 | 2014 |
| Experimental and simulation studies of resistivity in nanoscale copper films AE Yarimbiyik, HA Schafft, RA Allen, MD Vaudin, ME Zaghloul Microelectronics Reliability 49 (2), 127-134, 2009 | 33 | 2009 |
| System for sampling the sizes, geometrical distribution, and frequency of small particles accumulating on a solid surface MW Cresswell, RA Allen, LW Linholm, MC Peckerar US Patent 5,218,211, 1993 | 33 | 1993 |
| Monocrystalline test and reference structures, and use for calibrating instruments MW Cresswell, RN Ghoshtagore, LW Linholm, RA Allen, JJ Sniegowski, ... US Patent 5,920,067, 1999 | 32 | 1999 |
| A new test structure for the electrical measurement of the width of short features with arbitrarily wide voltage taps RA Allen, MW Cresswell, LM Buck IEEE electron device letters 13 (6), 322-324, 1992 | 31 | 1992 |
| Controlled formation and resistivity scaling of nickel silicide nanolines B Li, Z Luo, L Shi, JP Zhou, L Rabenberg, PS Ho, RA Allen, MW Cresswell Nanotechnology 20 (8), 085304, 2009 | 30 | 2009 |
Ronald DixsonNISTEmail verificata su nist.gov
