Matthew Colburn
Matthew Colburn
Facebook Reality Labs, Oculus Research, IBM Research, University of Texas at Austin
Email verificata su alumni.utexas.net - Home page
Titolo
Citata da
Citata da
Anno
Step and flash imprint lithography: a new approach to high-resolution patterning
M Colburn, SC Johnson, MD Stewart, S Damle, TC Bailey, B Choi, ...
Microlithography'99, 379-389, 1999
9511999
STEP AND FLASH IMPRINT LITHOGRAPHY
CG Willson, ME Colburn
EP Patent 1,228,401, 2005
5322005
Step and flash imprint lithography
CG Willson, ME Colburn
US Patent 6,334,960, 2002
5292002
Polymer self assembly in semiconductor microelectronics
CT Black, R Ruiz, G Breyta, JY Cheng, ME Colburn, KW Guarini, HC Kim, ...
IBM Journal of Research and Development 51 (5), 605-633, 2007
5082007
Step and flash imprint lithography: Template surface treatment and defect analysis
T Bailey, BJ Choi, M Colburn, M Meissl, S Shaya, JG Ekerdt, ...
Journal of Vacuum Science & Technology B 18 (6), 3572-3577, 2000
4952000
Template for room temperature, low pressure micro-and nano-imprint lithography
T Bailey, BJ Choi, M Colburn, SV Sreenivasan, CG Willson, J Ekerdt
US Patent 6,696,220, 2004
4102004
Simple and versatile methods to integrate directed self-assembly with optical lithography using a polarity-switched photoresist
JY Cheng, DP Sanders, HD Truong, S Harrer, A Friz, S Holmes, ...
Acs Nano 4 (8), 4815-4823, 2010
2672010
Patterning curved surfaces: Template generation by ion beam proximity lithography and relief transfer by step and flash imprint lithography
P Ruchhoeft, M Colburn, B Choi, H Nounu, S Johnson, T Bailey, S Damle, ...
Journal of Vacuum Science & Technology B 17 (6), 2965-2969, 1999
2061999
Design of orientation stages for step and flash imprint lithography
BJ Choi, SV Sreenivasan, S Johnson, M Colburn, CG Wilson
Precision Engineering 25 (3), 192-199, 2001
1772001
Closed air gap interconnect structure
KL Saenger, M Surendra, SV Nitta, S Purushothaman, ME Colburn, ...
US Patent 7,361,991, 2008
1672008
Step and flash imprint lithography for sub-100-nm patterning
M Colburn, A Grot, MN Amistoso, BJ Choi, TC Bailey, JG Ekerdt, ...
Microlithography 2000, 453-457, 2000
1622000
High-resolution overlay alignment methods for imprint lithography
SV Sreenivasan, BJ Choi, M Colburn, T Bailey
US Patent 6,921,615, 2005
1572005
Sidewall image transfer process employing a cap material layer for a metal nitride layer
JC Arnold, SD Burns, ME Colburn, DV Horak, Y Yin
US Patent 20,120,282,779, 2012
1512012
Sidewall image transfer process employing a cap material layer for a metal nitride layer
JC Arnold, SD Burns, ME Colburn, DV Horak, Y Yin
US Patent 8,298,954, 2012
1512012
Development and advantages of step-and-flash lithography
M Colburn, T Bailey, BJ Choi, JG Ekerdt, SV Sreenivasan, CG Willson
Solid State Technology 44 (7), 67-80, 2001
1492001
Two-Dimensional Pattern Formation Using Graphoepitaxy of PS-b-PMMA Block Copolymers for Advanced FinFET Device and Circuit Fabrication
H Tsai, JW Pitera, H Miyazoe, S Bangsaruntip, SU Engelmann, CC Liu, ...
ACS nano 8 (5), 5227-5232, 2014
1482014
DSA grapho-epitaxy process with etch stop material
JA Abdallah, ME Colburn, SJ Holmes, D Kawamura, C Liu, ...
US Patent 8,859,433, 2014
1472014
Methods for high-precision gap and orientation sensing between a transparent template and substrate for imprint lithography
BJ Choi, M Colburn, SV Sreenivasan, CG Willson, T Bailey, J Ekerdt
US Patent 6,954,275, 2005
1432005
Methods for high-precision gap and orientation sensing between a transparent template and substrate for imprint lithography
BJ Choi, M Colburn, SV Sreenivasan, CG Willson, T Bailey, J Ekerdt
US Patent 6,954,275, 2005
1432005
Imprint lithography template having a feature size under 250 nm
TC Bailey, BJ Choi, ME Colburn, SV Sreenivasan, CG Willson, JG Ekerdt
US Patent 7,229,273, 2007
134*2007
Il sistema al momento non pu eseguire l'operazione. Riprova pi tardi.
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