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Thaddeus J. Asel
Thaddeus J. Asel
Email verificata su us.af.mil
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Citata da
Citata da
Anno
Direct observation of a two-dimensional hole gas at oxide interfaces
H Lee, N Campbell, J Lee, TJ Asel, TR Paudel, H Zhou, JW Lee, ...
Nature materials 17 (3), 231-236, 2018
1892018
Optical signatures of deep level defects in Ga2O3
H Gao, S Muralidharan, N Pronin, MR Karim, SM White, T Asel, G Foster, ...
Applied Physics Letters 112 (24), 2018
1442018
Lateral β-Ga2O3 field effect transistors
KD Chabak, KD Leedy, AJ Green, S Mou, AT Neal, T Asel, ER Heller, ...
Semiconductor Science and Technology 35 (1), 013002, 2019
1232019
Tailoring the electronic structure of covalently functionalized germanane via the interplay of ligand strain and electronegativity
S Jiang, K Krymowski, T Asel, MQ Arguilla, ND Cultrara, E Yanchenko, ...
Chemistry of Materials 28 (21), 8071-8077, 2016
812016
Pulsed Power Performance of β-Ga₂O₃ MOSFETs at L-Band
NA Moser, T Asel, KJ Liddy, M Lindquist, NC Miller, S Mou, A Neal, ...
IEEE Electron Device Letters 41 (7), 989-992, 2020
382020
Native point defect formation in flash sintered ZnO studied by depth-resolved cathodoluminescence spectroscopy
H Gao, TJ Asel, JW Cox, Y Zhang, J Luo, LJ Brillson
Journal of Applied Physics 120 (10), 2016
312016
Toward high voltage radio frequency devices in β-Ga2O3
N Moser, K Liddy, A Islam, N Miller, K Leedy, T Asel, S Mou, A Green, ...
Applied Physics Letters 117 (24), 2020
302020
γ-phase inclusions as common structural defects in alloyed β-(AlxGa1− x) 2O3 and doped β-Ga2O3 films
CS Chang, N Tanen, V Protasenko, TJ Asel, S Mou, HG Xing, D Jena, ...
APL Materials 9 (5), 2021
272021
Reduction of unintentional Si doping in β-Ga2O3 grown via plasma-assisted molecular beam epitaxy
TJ Asel, E Steinbrunner, J Hendricks, AT Neal, S Mou
Journal of Vacuum Science & Technology A 38 (4), 2020
252020
Identification of a functional point defect in
D Lee, H Wang, BA Noesges, TJ Asel, J Pan, JW Lee, Q Yan, LJ Brillson, ...
Physical Review Materials 2 (6), 060403, 2018
222018
Controlled Si doping of β-Ga2O3 by molecular beam epitaxy
JP McCandless, V Protasenko, BW Morell, E Steinbrunner, AT Neal, ...
Applied Physics Letters 121 (7), 2022
172022
Near-nanoscale-resolved energy band structure of LaNiO3/La2/3Sr1/3MnO3/SrTiO3 heterostructures and their interfaces
TJ Asel, H Gao, TJ Heinl, D Adkins, PM Woodward, J Hoffman, ...
Journal of Vacuum Science & Technology B 33 (4), 2015
142015
Uniform large-area growth of nanotemplated high-quality monolayer MoS2
JR Young, M Chilcote, M Barone, J Xu, J Katoch, YK Luo, S Mueller, ...
Applied Physics Letters 110 (26), 2017
132017
Influence of surface chemistry on water absorption in functionalized germanane
TJ Asel, WLB Huey, B Noesges, E Molotokaite, SC Chien, Y Wang, ...
Chemistry of Materials 32 (4), 1537-1544, 2020
112020
Identification of Ge vacancies as electronic defects in methyl-and hydrogen-terminated germanane
TJ Asel, E Yanchenko, X Yang, S Jiang, K Krymowski, Y Wang, A Trout, ...
Applied Physics Letters 113 (6), 2018
102018
High conductivity β-Ga2O3 formed by hot Si ion implantation
A Sardar, T Isaacs-Smith, J Lawson, T Asel, RB Comes, JN Merrett, ...
Applied Physics Letters 121 (26), 2022
82022
Direct correlation and strong reduction of native point defects and microwave dielectric loss in air-annealed (Ba, Sr) TiO3
ZQ Zeng, A Podpirka, SW Kirchoefer, TJ Asel, LJ Brillson
Applied Physics Letters 106 (18), 2015
72015
Surface relaxation and rumpling of Sn-doped
A Pancotti, TC Back, W Hamouda, M Lachheb, C Lubin, P Soukiassian, ...
Physical Review B 102 (24), 245306, 2020
52020
Influence of nitride buffer layers on superconducting properties of niobium nitride
JH Goldsmith, R Gibson, T Cooper, TJ Asel, S Mou, DC Look, JS Derov, ...
Journal of Vacuum Science & Technology A 36 (6), 2018
52018
Topological Dirac semimetal Na3Bi films in the ultrathin limit via alternating layer molecular beam epitaxy
IV Pinchuk, TJ Asel, A Franson, T Zhu, YM Lu, LJ Brillson, ...
APL Materials 6 (8), 2018
52018
Il sistema al momento non può eseguire l'operazione. Riprova più tardi.
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