| Multicenter randomized trial of cerclage for preterm birth prevention in high-risk women with shortened midtrimester cervical length J Owen, G Hankins, JD Iams, V Berghella, JS Sheffield, A Perez-Delboy, ... American journal of obstetrics and gynecology 201 (4), 375. e1-375. e8, 2009 | 585 | 2009 |
| Direct writing of submicron metallic features with a scanning tunneling microscope RM Silver, EE Ehrichs, AL De Lozanne Applied physics letters 51 (4), 247-249, 1987 | 175 | 1987 |
| As‐deposited superconducting Y‐Ba‐Cu‐O thin films on Si, Al2O3, and SrTiO3 substrates RM Silver, AB Berezin, M Wendman, AL De Lozanne Applied physics letters 52 (25), 2174-2176, 1988 | 136 | 1988 |
| Fundamental limits of optical critical dimension metrology: a simulation study R Silver, T Germer, R Attota, BM Barnes, B Bunday, J Allgair, E Marx, ... Metrology, Inspection, and Process Control for Microlithography XXI 6518 …, 2007 | 104 | 2007 |
| Direct writing with the scanning tunneling microscope EE Ehrichs, RM Silver, AL De Lozanne Journal of Vacuum Science Technology A: Vacuum Surfaces and Films 6 (2), 540-543, 1988 | 91 | 1988 |
| Scatterfield microscopy for extending the limits of image-based optical metrology RM Silver, BM Barnes, R Attota, J Jun, M Stocker, E Marx, HJ Patrick Applied optics 46 (20), 4248-4257, 2007 | 87 | 2007 |
| Through-focus scanning-optical-microscope imaging method for nanoscale dimensional analysis R Attota, TA Germer, RM Silver Optics Letters 33 (17), 1990-1992, 2008 | 77 | 2008 |
| Developing an uncertainty analysis for optical scatterometry TA Germer, HJ Patrick, RM Silver, B Bunday Metrology, Inspection, and Process Control for Microlithography XXIII 7272 …, 2009 | 73 | 2009 |
| Sputter deposition of YBa2Cu3O7−y thin films RM Silver, J Talvacchio, AL De Lozanne Applied physics letters 51 (25), 2149-2151, 1987 | 65 | 1987 |
| Atom‐by‐atom fabrication of single and few dopant quantum devices J Wyrick, X Wang, RV Kashid, P Namboodiri, SW Schmucker, ... Advanced Functional Materials 29 (52), 1903475, 2019 | 53 | 2019 |
| Nanometrology using a through-focus scanning optical microscopy method R Attota, R Silver Measurement Science and Technology 22 (2), 024002, 2010 | 51 | 2010 |
| Improving optical measurement accuracy using multi-technique nested uncertainties RM Silver, NF Zhang, BM Barnes, H Zhou, A Heckert, R Dixson, ... Metrology, Inspection, and Process Control for Microlithography XXIII 7272 …, 2009 | 50 | 2009 |
| Deep subwavelength nanometric image reconstruction using Fourier domain optical normalization J Qin, RM Silver, BM Barnes, H Zhou, RG Dixson, MA Henn Light: Science & Applications 5 (2), e16038-e16038, 2016 | 47 | 2016 |
| Improving optical measurement uncertainty with combined multitool metrology using a Bayesian approach NF Zhang, RM Silver, H Zhou, BM Barnes Applied Optics 51 (25), 6196-6206, 2012 | 45 | 2012 |
| Experimental realization of an extended Fermi-Hubbard model using a 2D lattice of dopant-based quantum dots X Wang, E Khatami, F Fei, J Wyrick, P Namboodiri, R Kashid, AF Rigosi, ... Nature Communications 13 (1), 6824, 2022 | 40 | 2022 |
| Three-dimensional deep sub-wavelength defect detection using λ= 193 nm optical microscopy BM Barnes, MY Sohn, F Goasmat, H Zhou, AE Vladár, RM Silver, A Arceo Optics express 21 (22), 26219-26226, 2013 | 37 | 2013 |
| Optical through-focus technique that differentiates small changes in line width, line height, and sidewall angle for CD, overlay, and defect metrology applications R Attota, R Silver, BM Barnes Metrology, Inspection, and Process Control for Microlithography XXII 6922 …, 2008 | 33 | 2008 |
| Angle resolved optical metrology RM Silver, BM Barnes, A Heckert, R Attota, R Dixson, J Jun Metrology, Inspection, and Process Control for Microlithography XXII 6922 …, 2008 | 33 | 2008 |
| Enhancing 9 nm node dense patterned defect optical inspection using polarization, angle, and focus BM Barnes, F Goasmat, MY Sohn, H Zhou, RM Silver, A Arceo Metrology, Inspection, and Process Control for Microlithography XXVII 8681 …, 2013 | 32 | 2013 |
| High-resolution optical metrology RM Silver, R Attota, M Stocker, M Bishop, L Howard, T Germer, E Marx, ... Metrology, Inspection, and Process Control for Microlithography XIX 5752, 67-79, 2005 | 31 | 2005 |
