Richard Silver
Richard Silver
Email verificata su nist.gov
Titolo
Citata da
Citata da
Anno
Direct writing of submicron metallic features with a scanning tunneling microscope
RM Silver, EE Ehrichs, AL De Lozanne
Applied physics letters 51 (4), 247-249, 1987
1601987
As‐deposited superconducting Y‐Ba‐Cu‐O thin films on Si, Al2O3, and SrTiO3 substrates
RM Silver, AB Berezin, M Wendman, AL De Lozanne
Applied physics letters 52 (25), 2174-2176, 1988
1341988
Fundamental limits of optical critical dimension metrology: a simulation study
R Silver, T Germer, R Attota, BM Barnes, B Bunday, J Allgair, E Marx, ...
Metrology, Inspection, and Process Control for Microlithography XXI 6518, 65180U, 2007
962007
Direct writing with the scanning tunneling microscope
EE Ehrichs, RM Silver, AL De Lozanne
Journal of Vacuum Science & Technology A: Vacuum, Surfaces, and Films 6 (2…, 1988
891988
Scatterfield microscopy for extending the limits of image-based optical metrology
RM Silver, BM Barnes, R Attota, J Jun, M Stocker, E Marx, HJ Patrick
Applied optics 46 (20), 4248-4257, 2007
832007
Developing an uncertainty analysis for optical scatterometry
TA Germer, HJ Patrick, RM Silver, B Bunday
Metrology, Inspection, and Process Control for Microlithography XXIII 7272…, 2009
682009
Sputter deposition of YBa2Cu3O7−y thin films
RM Silver, J Talvacchio, AL De Lozanne
Applied physics letters 51 (25), 2149-2151, 1987
651987
Through-focus scanning-optical-microscope imaging method for nanoscale dimensional analysis
R Attota, TA Germer, RM Silver
Optics Letters 33 (17), 1990-1992, 2008
642008
Photomask Metrology, Photomask Fabrication Technology
RM Silver, A Vladar
522005
Improving optical measurement accuracy using multi-technique nested uncertainties
RM Silver, NF Zhang, BM Barnes, H Zhou, A Heckert, R Dixson, ...
Metrology, Inspection, and Process Control for Microlithography XXIII 7272…, 2009
482009
Nanometrology using a through-focus scanning optical microscopy method
R Attota, R Silver
Measurement Science and Technology 22 (2), 024002, 2010
462010
Improving optical measurement uncertainty with combined multitool metrology using a Bayesian approach
NF Zhang, RM Silver, H Zhou, BM Barnes
Applied Optics 51 (25), 6196-6206, 2012
402012
Deep subwavelength nanometric image reconstruction using Fourier domain optical normalization
J Qin, RM Silver, BM Barnes, H Zhou, RG Dixson, MA Henn
Light: Science & Applications 5 (2), e16038-e16038, 2016
362016
Angle resolved optical metrology
RM Silver, BM Barnes, A Heckert, R Attota, R Dixson, J Jun
Metrology, Inspection, and Process Control for Microlithography XXII 6922…, 2008
322008
High-resolution optical metrology
RM Silver, R Attota, M Stocker, M Bishop, L Howard, T Germer, E Marx, ...
Metrology, Inspection, and Process Control for Microlithography XIX 5752, 67-79, 2005
312005
Optical through-focus technique that differentiates small changes in line width, line height, and sidewall angle for CD, overlay, and defect metrology applications
R Attota, R Silver, BM Barnes
Metrology, Inspection, and Process Control for Microlithography XXII 6922…, 2008
302008
High-resolution optical overlay metrology
RM Silver, R Attota, M Stocker, M Bishop, JSJ Jun, E Marx, MP Davidson, ...
Metrology, Inspection, and Process Control for Microlithography XVIII 5375…, 2004
302004
Evaluation of new in-chip and arrayed line overlay target designs
R Attota, RM Silver, M Bishop, E Marx, JSJ Jun, M Stocker, MP Davidson, ...
Metrology, Inspection, and Process Control for Microlithography XVIII 5375…, 2004
272004
New method to enhance overlay tool performance
R Attota, RM Silver, MT Stocker, E Marx, JSJ Jun, MP Davidson, ...
Metrology, Inspection, and Process Control for Microlithography Xvii 5038…, 2003
272003
Comparison of measured optical image profiles of silicon lines with two different theoretical models
RM Silver, R Attota, M Stocker, JSJ Jun, E Marx, RD Larrabee, B Russo, ...
Metrology, Inspection, and Process Control for Microlithography XVI 4689…, 2002
272002
Il sistema al momento non pu eseguire l'operazione. Riprova pi tardi.
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