| Solubility studies of inorganic–organic hybrid nanoparticle photoresists with different surface functional groups L Li, S Chakrabarty, J Jiang, B Zhang, C Ober, EP Giannelis Nanoscale 8 (3), 1338-1343, 2016 | 61 | 2016 |
| Metal oxide nanoparticle photoresists for EUV patterning J Jiang, S Chakrabarty, M Yu, CK Ober Journal of Photopolymer Science and Technology 27 (5), 663-666, 2014 | 55 | 2014 |
| Ultrafast self-assembly of sub-10 nm block copolymer nanostructures by solvent-free high-temperature laser annealing J Jiang, AG Jacobs, B Wenning, C Liedel, MO Thompson, CK Ober ACS applied materials & interfaces 9 (37), 31317-31324, 2017 | 39 | 2017 |
| Unraveling the role of secondary electrons upon their interaction with photoresist during EUV exposure I Pollentier, Y Vesters, J Jiang, P Vanelderen, D De Simone International Conference on Extreme Ultraviolet Lithography 2017 10450, 65-71, 2017 | 26 | 2017 |
| Oxide nanoparticle EUV (ONE) photoresists: Current understanding of the unusual patterning mechanism J Jiang, B Zhang, M Yu, L Li, M Neisser, JS Chun, EP Giannelis, CK Ober Journal of Photopolymer Science and Technology 28 (4), 515-518, 2015 | 26 | 2015 |
| Comparative Metabolomic Study of Penicillium chrysogenum During Pilot and Industrial Penicillin Fermentations MZ Ding, H Lu, JS Cheng, Y Chen, J Jiang, B Qiao, BZ Li, YJ Yuan Applied biochemistry and biotechnology 168, 1223-1238, 2012 | 17 | 2012 |
| Difference in EUV photoresist design towards reduction of LWR and LCDU J Jiang, D De Simone, G Vandenberghe Advances in Patterning Materials and Processes XXXIV 10146, 64-71, 2017 | 15 | 2017 |
| New developments in ligand-stabilized metal oxide nanoparticle photoresists for EUV lithography C Ober, J Jiang, B Zhang, L Li, E Giannelis, JS Chun, M Neisser, ... Extreme Ultraviolet (EUV) Lithography VI 9422, 27-32, 2015 | 15 | 2015 |
| Control of polystyrene-block-poly(methyl methacrylate) directed self-assembly by laser-induced millisecond thermal annealing AG Jacobs, B Jung, J Jiang, CK Ober, MO Thompson Journal of Micro/Nanolithography, MEMS, and MOEMS 14 (3), 031205-031205, 2015 | 14 | 2015 |
| Laser spike annealing of DSA photoresists J Jiang, A Jacobs, MO Thompson, CK Ober Journal of Photopolymer Science and Technology 28 (5), 631-634, 2015 | 13 | 2015 |
| Sensitizers in EUV chemically amplified resist: mechanism of sensitivity improvement Y Vesters, J Jiang, H Yamamoto, D De Simone, T Kozawa, S De Gendt, ... Extreme Ultraviolet (EUV) Lithography IX 10583, 28-38, 2018 | 12 | 2018 |
| Metal sensitizer in chemically amplified EUV resist: a study of sensitivity enhancement and dissolution J Jiang, D De Simone, G Vandenberghe Journal of Photopolymer Science and Technology 30 (5), 591-597, 2017 | 8 | 2017 |
| Role of Metal Sensitizers for Sensitivity Improvement in EUV Chemically Amplified Resist H Yamamoto, Y Vesters, J Jiang, D De Simone, G Vandenberghe, ... Journal of photopolymer science and technology 31 (6), 747-751, 2018 | 7 | 2018 |
| Systematic study of ligand structures of metal oxide EUV nanoparticle photoresists J Jiang, M Yu, B Zhang, M Neisser, JS Chun, EP Giannelis, CK Ober Extreme Ultraviolet (EUV) Lithography VI 9422, 664-669, 2015 | 7 | 2015 |
| Sensitizers in extreme ultraviolet chemically amplified resists: mechanism of sensitivity improvement Y Vesters, J Jiang, H Yamamoto, D De Simone, T Kozawa, S De Gendt, ... Journal of Micro/Nanolithography, MEMS, and MOEMS 17 (4), 043506-043506, 2018 | 6 | 2018 |
| Sensitizer for euv chemically amplified resist: Metal versus halogen J Jiang, G Giordano, R Fallica, D DeSimone, G Vandenberghe Journal of Photopolymer Science and Technology 32 (1), 21-25, 2019 | 5 | 2019 |
| Impact of acid statistics on EUV local critical dimension uniformity J Jiang, D De Simone, O Yildirim, M Meeuwissen, R Hoefnagels, ... Extreme Ultraviolet (EUV) Lithography VIII 10143, 428-438, 2017 | 5 | 2017 |
| Line edge roughness of high deprotection activation energy photoresist by using sub-millisecond post exposure bake J Jiang, B Jung, MO Thompson, CK Ober Advances in Resist Materials and Processing Technology XXX 8682, 443-449, 2013 | 5 | 2013 |
| Chemical reaction and diffusion kinetics during laser-induced submillisecond heating for lithographic applications J Jiang, B Jung, MO Thompson, CK Ober Journal of Vacuum Science & Technology B 37 (4), 2019 | 3 | 2019 |
| Line width roughness reduction by rational design of photoacid generator for sub-millisecond laser post-exposure bake J Jiang, MO Thompson, CK Ober Advances in Patterning Materials and Processes XXXI 9051, 81-86, 2014 | 3 | 2014 |
