Vladimir Liberman
Vladimir Liberman
MIT Lincoln Laboratory
Email verificata su ll.mit.edu
Titolo
Citata da
Citata da
Anno
Broadband transparent optical phase change materials for high-performance nonvolatile photonics
Y Zhang, JB Chou, J Li, H Li, Q Du, A Yadav, S Zhou, MY Shalaginov, ...
Nature communications 10 (1), 1-9, 2019
2042019
Method of forming active devices of different gatelengths using lithographic printed gate images of same length
JW Golz, B Khan, JC Liu, CJ Waskiewicz, TJ Wu
US Patent 6,703,312, 2004
1162004
Super‐resolution microscopy by movable thin‐films with embedded microspheres: resolution analysis
KW Allen, N Farahi, Y Li, NI Limberopoulos, DE Walker Jr, AM Urbas, ...
Annalen der Physik 527 (7-8), 513-522, 2015
1132015
Review of technology for 157-nm lithography
AK Bates, M Rothschild, TM Bloomstein, TH Fedynyshyn, RR Kunz, ...
IBM Journal of Research and development 45 (5), 605-614, 2001
992001
Molecular beam epitaxy of high quality Hg1− xCdxTe films with control of the composition distribution
VS Varavin, SA Dvoretsky, VI Liberman, NN Mikhailov, YG Sidorov
Journal of crystal growth 159 (1-4), 1161-1166, 1996
961996
Ultraviolet spectroscopy and UV lasers
P Misra, MA Dubinskii
CRC Press, 2002
952002
A nanoparticle convective directed assembly process for the fabrication of periodic surface enhanced Raman spectroscopy substrates
V Liberman, C Yilmaz, TM Bloomstein, S Somu, Y Echegoyen, ...
Advanced Materials 22 (38), 4298-4302, 2010
912010
Experimentation and modeling of organic photocontamination on lithographic optics
RR Kunz, V Liberman, DK Downs
Journal of Vacuum Science & Technology B: Microelectronics and Nanometerá…, 2000
862000
Materials issues for optical components and photomasks in 157 nm lithography
V Liberman, TM Bloomstein, M Rothschild, JHC Sedlacek, RS Uttaro, ...
Journal of Vacuum Science & Technology B: Microelectronics and Nanometerá…, 1999
831999
157 nm: Deepest deep-ultraviolet yet
M Rothschild, TM Bloomstein, JE Curtin, DK Downs, TH Fedynyshyn, ...
Journal of Vacuum Science & Technology B: Microelectronics and Nanometerá…, 1999
811999
Periodically poled BaMgF4 for ultraviolet frequency generation
SC Buchter, TY Fan, V Liberman, JJ Zayhowski, M Rothschild, EJ Mason, ...
Optics letters 26 (21), 1693-1695, 2001
742001
Liquid immersion lithography: Why, how, and when?
M Rothschild, TM Bloomstein, RR Kunz, V Liberman, M Switkes, ...
Journal of Vacuum Science & Technology B: Microelectronics and Nanometerá…, 2004
682004
Excimer-laser-induced degradation of fused silica and calcium fluoride for 193-nm lithographic applications
V Liberman, M Rothschild, JHC Sedlacek, RS Uttaro, A Grenville, ...
Optics letters 24 (1), 58-60, 1999
571999
Recent trends in optical lithography
M Rothschild, TM Bloomstein, TH Fedynyshyn, RR Kunz, V Liberman, ...
Lincoln Laboratory Journal 14 (2), 221-236, 2003
562003
The controlled growth of high-quality mercury cadmium telluride
VS Varavin, SA Dvoretsky, VI Liberman, NN Mikhailov, YG Sidorov
Thin solid films 267 (1-2), 121-125, 1995
521995
Permittivity evaluation of multilayered hyperbolic metamaterials: Ellipsometry vs. reflectometry
T Tumkur, Y Barnakov, ST Kee, MA Noginov, V Liberman
Journal of Applied Physics 117 (10), 103104, 2015
502015
Mid-infrared photothermal heterodyne spectroscopy in a liquid crystal using a quantum cascade laser
A MŰrtiri, T Jeys, V Liberman, MK Hong, J Mertz, H Altug, S Erramilli
Applied physics letters 101 (4), 044101, 2012
492012
Reconstitution of biological molecular generators of electric current. Bacteriochlorophyll and plant chlorophyll complexes.
EL Barsky, Z Dancshazy, LA Drachey, MD Il'ina, AA Jasaitis, ...
Journal of Biological Chemistry 251 (22), 7066-7071, 1976
481976
The growth of high‐quality MCT films by MBE using in‐situ ellipsometry
KK Svitashev, SA Dvoretsky, YG Sidorov, VA Shvets, AS Mardezhov, ...
Crystal Research and Technology 29 (7), 931-937, 1994
471994
Aluminum plasmonics: optimization of plasmonic properties using liquid-prism-coupled ellipsometry
K Diest, V Liberman, DM Lennon, PB Welander, M Rothschild
Optics express 21 (23), 28638-28650, 2013
452013
Il sistema al momento non pu˛ eseguire l'operazione. Riprova pi¨ tardi.
Articoli 1–20