| Highly tunable refractive index visible-light metasurface from block copolymer self-assembly JY Kim, H Kim, BH Kim, T Chang, J Lim, HM Jin, JH Mun, YJ Choi, ... Nature communications 7 (1), 12911, 2016 | 166 | 2016 |
| Au–Ag core–shell nanoparticle array by block copolymer lithography for synergistic broadband plasmonic properties SK Cha, JH Mun, T Chang, SY Kim, JY Kim, HM Jin, JY Lee, J Shin, ... ACS nano 9 (5), 5536-5543, 2015 | 150 | 2015 |
| Laser crystallization of organic–inorganic hybrid perovskite solar cells T Jeon, HM Jin, SH Lee, JM Lee, HI Park, MK Kim, KJ Lee, B Shin, ... ACS nano 10 (8), 7907-7914, 2016 | 134 | 2016 |
| Laser writing block copolymer self-assembly on graphene light-absorbing layer HM Jin+, SH Lee+, JY Kim, SW Son, BH Kim, HK Lee, JH Mun, SK Cha, ... ACS nano 10 (3), 3435-3442, 2016 | 116 | 2016 |
| Flexible and Transferrable Self‐Assembled Nanopatterning on Chemically Modified Graphene JY Kim, BH Kim, JO Hwang, SJ Jeong, DO Shin, JH Mun, YJ Choi, HM Jin, ... Advanced Materials 25 (9), 1331-1335, 2013 | 109 | 2013 |
| Flash Light Millisecond Self‐Assembly of High χ Block Copolymers for Wafer‐Scale Sub‐10 nm Nanopatterning HM Jin+, DY Park+, SJ Jeong, GY Lee, JY Kim, JH Mun, SK Cha, J Lim, ... Advanced Materials 29 (32), 1700595, 2017 | 90 | 2017 |
| Smart Nanostructured Materials based on Self‐Assembly of Block Copolymers JH Kim+, HM Jin+, GG Yang, KH Han, T Yun, JY Shin, SJ Jeong, SO Kim Advanced Functional Materials, 1902049, 2020 | 76 | 2020 |
| Ultralarge Area Sub-10 nm Plasmonic Nanogap Array by Block Copolymer Self-Assembly for Reliable High-Sensitivity SERS HM Jin+, JY Kim+, M Heo, SJ Jeong, BH Kim, SK Cha, KH Han, JH Kim, ... ACS applied materials & interfaces 10 (51), 44660-44667, 2018 | 68 | 2018 |
| 3D Tailored Crumpling of Block‐Copolymer Lithography on Chemically Modified Graphene JY Kim, J Lim, HM Jin, BH Kim, SJ Jeong, DS Choi, DJ Li, SO Kim Advanced Materials 28 (8), 1591-1596, 2016 | 65 | 2016 |
| Atomic layer deposition assisted pattern multiplication of block copolymer lithography for 5 nm scale nanopatterning HS Moon, JY Kim, HM Jin, WJ Lee, HJ Choi, JH Mun, YJ Choi, SK Cha, ... Advanced Functional Materials 24 (27), 4343-4348, 2014 | 64 | 2014 |
| Electrical biomolecule detection using nanopatterned silicon via block copolymer lithography CK Jeong+, HM Jin+, JH Ahn, TJ Park, HG Yoo, M Koo, YK Choi, SO Kim, ... small 10 (2), 337-343, 2014 | 59 | 2014 |
| 2D Metal Chalcogenide Nanopatterns by Block Copolymer Lithography T Yun+, HM Jin+, DH Kim, KH Han, GG Yang, GY Lee, GS Lee, JY Choi, ... Advanced Functional Materials 28 (50), 1804508, 2018 | 57 | 2018 |
| Three-dimensional silicon electronic systems fabricated by compressive buckling process BH Kim, J Lee, SM Won, Z Xie, JK Chang, Y Yu, YK Cho, H Jang, ... ACS nano 12 (5), 4164-4171, 2018 | 44 | 2018 |
| Nanoscale physical unclonable function labels based on block copolymer self-assembly JH Kim, S Jeon, JH In, S Nam, HM Jin, KH Han, GG Yang, HJ Choi, ... Nature Electronics 5 (7), 433-442, 2022 | 43 | 2022 |
| Block Copolymer Nanopatterning for Nonsemiconductor Device Applications GG Yang, HJ Choi, KH Han, JH Kim, CW Lee, EI Jung, HM Jin*, SO Kim* ACS Applied Materials & Interfaces 14 (10), 12011-12037, 2022 | 42 | 2022 |
| Perovskite light-emitting diodes via laser crystallization: systematic investigation on grain size effects for device performance SJ Kim, J Byun, T Jeon, HM Jin, HR Hong, SO Kim ACS applied materials & interfaces 10 (3), 2490-2495, 2018 | 40 | 2018 |
| Anomalous rapid defect annihilation in self-assembled nanopatterns by defect melting BH Kim, SJ Park, HM Jin, JY Kim, SW Son, MH Kim, CM Koo, J Shin, ... Nano Letters 15 (2), 1190-1196, 2015 | 39 | 2015 |
| Device-oriented graphene nanopatterning by mussel-inspired directed block copolymer self-assembly S Park, JM Yun, UN Maiti, HS Moon, HM Jin, SO Kim Nanotechnology 25 (1), 014008, 2013 | 38 | 2013 |
| Revisiting Lithium‐and Sodium‐Ion Storage in Hard Carbon Anodes H Kim, JC Hyun, DH Kim, JH Kwak, JB Lee, JH Moon, J Choi, HD Lim, ... Advanced Materials 35 (12), 2209128, 2023 | 36 | 2023 |
| Large-area, highly oriented lamellar block copolymer nanopatterning directed by graphoepitaxially assembled cylinder nanopatterns HS Moon, DO Shin, BH Kim, HM Jin, S Lee, MG Lee, SO Kim Journal of Materials Chemistry 22 (13), 6307-6310, 2012 | 32 | 2012 |
sang ouk kimKAISTEmail verificata su kaist.ac.kr
