High-specific-power flexible transition metal dichalcogenide solar cells K Nassiri Nazif, A Daus, J Hong, N Lee, S Vaziri, A Kumar, F Nitta, ...
nature Communications 12 (1), 7034, 2021
109 2021 Post-CMOS compatible aluminum scandium nitride/2D channel ferroelectric field-effect-transistor memory X Liu, D Wang, KH Kim, K Katti, J Zheng, P Musavigharavi, J Miao, ...
Nano Letters 21 (9), 3753-3761, 2021
106 2021 A multiple negative differential resistance heterojunction device and its circuit application to ternary static random access memory KH Kim, HY Park, J Shim, G Shin, M Andreev, J Koo, G Yoo, K Jung, ...
Nanoscale horizons 5 (4), 654-662, 2020
72 2020 Wurtzite and fluorite ferroelectric materials for electronic memory KH Kim, I Karpov, RH Olsson III, D Jariwala
Nature Nanotechnology 18 (5), 422-441, 2023
44 2023 Scalable CMOS back-end-of-line-compatible AlScN/two-dimensional channel ferroelectric field-effect transistors KH Kim, S Oh, MMA Fiagbenu, J Zheng, P Musavigharavi, P Kumar, ...
Nature nanotechnology 18 (9), 1044-1050, 2023
42 2023 Double negative differential transconductance characteristic: from device to circuit application toward quaternary inverter JH Lim, J Shim, BS Kang, G Shin, H Kim, M Andreev, KS Jung, KH Kim, ...
Advanced Functional Materials 29 (48), 1905540, 2019
40 2019 Double negative differential resistance device based on Hafnium Disulfide/Pentacene hybrid structure KS Jung, K Heo, MJ Kim, M Andreev, S Seo, JO Kim, JH Lim, KH Kim, ...
Advanced Science 7 (19), 2000991, 2020
32 2020 Negative differential transconductance device with a stepped gate dielectric for multi-valued logic circuits M Andreev, JW Choi, J Koo, H Kim, S Jung, KH Kim, JH Park
Nanoscale Horizons 5 (10), 1378-1385, 2020
29 2020 High-density, localized quantum emitters in strained 2D semiconductors G Kim, HM Kim, P Kumar, M Rahaman, CE Stevens, J Jeon, K Jo, KH Kim, ...
ACS nano 16 (6), 9651-9659, 2022
27 2022 High-Efficiency WSe2 Photovoltaic Devices with Electron-Selective Contacts KH Kim, M Andreev, S Choi, J Shim, H Ahn, J Lynch, T Lee, J Lee, ...
ACS nano 16 (6), 8827-8836, 2022
27 2022 Polarity control in a single transition metal dichalcogenide (TMD) transistor for homogeneous complementary logic circuits J Shim, S woon Jang, JH Lim, H Kim, DH Kang, KH Kim, S Seo, K Heo, ...
Nanoscale 11 (27), 12871-12877, 2019
22 2019 Tuning Polarity in WSe2 /AlScN FeFETs via Contact Engineering KH Kim, S Song, B Kim, P Musavigharavi, N Trainor, K Katti, C Chen, ...
ACS nano, 2024
2 2024 Negative capacitance field-effect transistors based on ferroelectric AlScN and 2D MoS2 S Song†, KH Kim†, S Chakravarthi, Z Han, G Kim, KY Ma, HS Shin, ...
Applied Physics Letters 123 (18), 2023
2 2023 Multi-negative differential transconductance device and method of producing the same JH Park, JW Choi, KH Kim, M Andreev
US Patent 11,329,169, 2022
1 2022 Scalable CMOS-BEOL compatible AlScN/2D Channel FE-FETs KH Kim, S Oh, MMA Fiagbenu, J Zheng, P Musavigharavi, P Kumar, ...
arXiv preprint arXiv:2201.02153, 2022
1 2022 Post CMOS Compatible Ferroelectric Field Effect Transistor With AIScN Dielectric And 2D Material Channel D Jariwala, RH Olsson III, X Liu, EA Stach, KH Kim
US Patent App. 17/354,256, 2021
1 2021 Negative Differential Resistance: Double Negative Differential Resistance Device Based on Hafnium Disulfide/Pentacene Hybrid Structure (Adv. Sci. 19/2020) KS Jung, K Heo, MJ Kim, M Andreev, S Seo, JO Kim, JH Lim, KH Kim, ...
Advanced Science 7 (19), 2070110, 2020
1 2020 Non-Volatile Control of Valley Polarized Emission in 2D WSe2-AlScN Heterostructures S Singh, KH Kim, K Jo, P Musavigharavi, B Kim, J Zheng, N Trainor, ...
arXiv preprint arXiv:2311.08275, 2023
2023 Scalable and Stable Ferroelectric Non-Volatile Memory at > 500 C DK Pradhan, DC Moore, G Kim, Y He, P Musavigharavi, KH Kim, ...
arXiv preprint arXiv:2309.04555, 2023
2023 MoS /Al Sc N negative capacitance field-effect transistors S Song†, KH Kim†, S Chakravarthi, Z Han, G Kim, KY Ma, HS Shin, ...
arXiv preprint arXiv:2308.00067, 2023
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