| Fabrication of 0.1 μm metal oxide semiconductor field‐effect transistors with the atomic force microscope SC Minne, HT Soh, P Flueckiger, CF Quate Applied physics letters 66 (6), 703-705, 1995 | 285 | 1995 |
| Atomic force microscope lithography using amorphous silicon as a resist and advances in parallel operation SC Minne, P Flueckiger, HT Soh, CF Quate Journal of Vacuum Science & Technology B: Microelectronics and Nanometer …, 1995 | 167 | 1995 |
| Bow-tie optical antenna probes for single-emitter scanning near-field optical microscopy JN Farahani, HJ Eisler, DW Pohl, M Pavius, P Flückiger, P Gasser, ... Nanotechnology 18 (12), 125506, 2007 | 155 | 2007 |
| CMOS compatible fully integrated Mach-Zehnder interferometer in SOI technology P Dainesi, A Kung, M Chabloz, A Lagos, P Fluckiger, A Ionescu, P Fazan, ... IEEE Photonics Technology Letters 12 (6), 660-662, 2000 | 142 | 2000 |
| Modeling and design of a low-voltage SOI suspended-gate MOSFET (SG-MOSFET) with a metal-over-gate architecture AM Ionescu, V Pott, R Fritschi, K Banerjee, MJ Declercq, P Renaud, ... proceedings International symposium on quality electronic design, 496-501, 2002 | 104 | 2002 |
| Integrable silicon microfluidic valve with pneumatic actuation A Luque, JM Quero, C Hibert, P Flückiger, AM Gañán-Calvo Sensors and Actuators A: Physical 118 (1), 144-151, 2005 | 53 | 2005 |
| Silicon sacrificial layer dry etching (SSLDE) for free-standing RF MEMS architectures S Frederico, C Hibert, R Fritschi, P Fluckiger, P Renaud, AM Ionescu The Sixteenth Annual International Conference on Micro Electro Mechanical …, 2003 | 50 | 2003 |
| Percolative behavior of the superconductive transition of YBa 2 Cu 3 O 7 films C Leemann, P Flückiger, V Marsico, JL Gavilano, PK Srivastava, P Lerch, ... Physical review letters 64 (25), 3082, 1990 | 42 | 1990 |
| Critical phase fluctuations in superconducting wire networks B Jeanneret, P Flückiger, JL Gavilano, C Leemann, P Martinoli Physical Review B 40 (16), 11374, 1989 | 34 | 1989 |
| Fabrication of vertical digital silicon optical micromirrors on suspended electrode for guided-wave optical switching applications R Guerre, C Hibert, Y Burri, P Flückiger, P Renaud Sensors and Actuators A: physical 123, 570-583, 2005 | 26 | 2005 |
| Vortex dynamics in Y Ba2Cu3O7 films P Martinoli, P Flückiger, V Marsico, PK Srivastava, C Leemann, ... Physica B: Condensed Matter 165, 1163-1164, 1990 | 25 | 1990 |
| High tuning range AlSi RF MEMS capacitors fabricated with sacrificial amorphous silicon surface micromachining R Fritschi, S Frédérico, C Hibert, P Flückiger, P Renaud, D Tsamados, ... Microelectronic engineering 73, 447-451, 2004 | 24 | 2004 |
| Profile angle control in SiO/sub 2/deep anisotropic dry etching for MEMS fabrication M Pavius, C Hibert, P Fluckiger, P Renaud, L Rolland, M Puech 17th IEEE International Conference on Micro Electro Mechanical Systems …, 2004 | 15 | 2004 |
| The suspended-gate MOSFET (SG-MOSFET): a modeling outlook for the design of RF MEMS switches and tunable capacitors V Pott, AM Ionescu, R Fritschi, C Hibert, P Fluckiger, M Declercq, ... 2001 International Semiconductor Conference. CAS 2001 Proceedings (Cat. No …, 2001 | 13 | 2001 |
| A novel RF MEMS technological platform R Fritschi, C Dehollain, MJ Declercq, AM Ionescu, C Hibert, P Fluckiger, ... IEEE 2002 28th Annual Conference of the Industrial Electronics Society …, 2002 | 8 | 2002 |
| J. Vac. Sci. Technol. B SC Minne, P Flueckiger, HT Soh, CF Quate J. Vac. Sci. Technol, 2456, 1995 | 8 | 1995 |
| Fabrication process for a microfluidic valve A Luque, JM Quero, C Hibert, P Fluckiger Proceedings of the 2003 International Symposium on Circuits and Systems …, 2003 | 6 | 2003 |
| Deep anisotropic etching of silicon using Low Pressure High Density Plasma. Presentation of complementary techniques and their applications in microtechnology. C Hibert, W Dufour, P Fluckiger ISPC15, 2001 | 6 | 2001 |
| The use of Life-Cycle assessment and product risk assessment within application development of chemicals: a case study of perchloroethylene use in dry cleaning PH Flückiger ETH Zurich, 1999 | 6 | 1999 |
| Silicon Sacrificial Layer Dry-Etching (SSLDE) for Free Standing RF MEMS Architecture S Federico, C Hibert, R Fritschi, P Fluckiger, P Renaud, AM Ionescu Proceedings of 16th Annual IEEE International Micro Electro-Mechanical …, 2003 | 5 | 2003 |
