| Anisotropic etching and nanoribbon formation in single-layer graphene LC Campos*, VR Manfrinato*, JD Sanchez-Yamagishi, J Kong, ... Nano Letters 9 (7), 2600–2604, 2009 | 579 | 2009 |
| Resolution Limits of Electron-Beam Lithography toward the Atomic Scale VR Manfrinato, L Zhang, D Su, H Duan, R Hobbs, EA Stach, K Berggren Nano Letters, 2013 | 352 | 2013 |
| Sub-10-nm half-pitch electron-beam lithography by using poly (methyl methacrylate) as a negative resist H Duan, D Winston, JKW Yang, BM Cord, VR Manfrinato, KK Berggren Journal of Vacuum Science & Technology B, Nanotechnology and …, 2010 | 138 | 2010 |
| Neon ion beam lithography (NIBL) D Winston*, VR Manfrinato*, SM Nicaise*, LL Cheong*, H Duan, ... Nano letters 11 (10), 4343-4347, 2011 | 72 | 2011 |
| Designs for a quantum electron microscope P Kruit, RG Hobbs, CS Kim, Y Yang, VR Manfrinato, J Hammer, S Thomas, ... Ultramicroscopy 164, 31-45, 2016 | 67 | 2016 |
| Determining the resolution limits of electron-beam lithography: direct measurement of the point-spread function VR Manfrinato, J Wen, L Zhang, Y Yang, RG Hobbs, B Baker, D Su, ... Nano letters 14 (8), 4406-4412, 2014 | 64 | 2014 |
| Aberration-corrected electron beam lithography at the one nanometer length scale VR Manfrinato, A Stein, L Zhang, CY Nam, KG Yager, EA Stach, CT Black Nano letters 17 (8), 4562-4567, 2017 | 58 | 2017 |
| Metrology for electron-beam lithography and resist contrast at the sub-10 nm scale H Duan, VR Manfrinato, JKW Yang, D Winston, BM Cord, KK Berggren Journal of Vacuum Science & Technology B, Nanotechnology and …, 2010 | 52 | 2010 |
| High-energy surface and volume plasmons in nanopatterned sub-10-nm aluminum nanostructures RG Hobbs*, VR Manfrinato*, Y Yang*, SA Goodman*, L Zhang, EA Stach, ... Nano Letters, 2016 | 38 | 2016 |
| Sub-5keV electron-beam lithography in hydrogen silsesquioxane resist VR Manfrinato, LL Cheong, H Duan, D Winston, HI Smith, KK Berggren Microelectronic Engineering 88 (10), 3070-3074, 2011 | 36 | 2011 |
| Controlled placement of colloidal quantum dots in sub-15 nm clusters VR Manfrinato, DD Wanger, DB Strasfeld, HS Han, F Marsili, JP Arrieta, ... Nanotechnology 24 (12), 125302, 2013 | 23 | 2013 |
| Electrochemical development of hydrogen silsesquioxane by applying an electrical potential S Strobel, KJ Harry, H Duan, JKW Yang, VR Manfrinato, KK Berggren Nanotechnology 22 (37), 375301, 2011 | 9 | 2011 |
| Patterning Si at the 1 nm Length Scale with Aberration‐Corrected Electron‐Beam Lithography: Tuning of Plasmonic Properties by Design VR Manfrinato, FE Camino, A Stein, L Zhang, M Lu, EA Stach, CT Black Advanced Functional Materials 29 (52), 1903429, 2019 | 7 | 2019 |
| Focused-helium-ion-beam blow forming of nanostructures: radiation damage and nanofabrication CS Kim, RG Hobbs, A Agarwal, Y Yang, VR Manfrinato, MP Short, J Li, ... Nanotechnology 31 (4), 045302, 2019 | 6 | 2019 |
| The Orientations of Large Aspect‐Ratio Coiled‐Coil Proteins Attached to Gold Nanostructures JB Chang, YH Kim, E Thompson, YH No, NH Kim, J Arrieta, ... Small 12 (11), 1498-1505, 2016 | 5 | 2016 |
| Single-digit nanometer electron-beam lithography with an aberration-corrected scanning transmission electron microscope FE Camino, VR Manfrinato, A Stein, L Zhang, M Lu, EA Stach, CT Black JoVE (Journal of Visualized Experiments), e58272, 2018 | 4 | 2018 |
| Sub-10-nm electron-beam lithography for templated placement of colloidal quantum dots VR Manfrinato Massachusetts Institute of Technology, 2011 | 3 | 2011 |
| 1‐nm Si Patterning: Patterning Si at the 1 nm Length Scale with Aberration‐Corrected Electron‐Beam Lithography: Tuning of Plasmonic Properties by Design (Adv. Funct. Mater. 52 … VR Manfrinato, FE Camino, A Stein, L Zhang, M Lu, EA Stach, CT Black Advanced Functional Materials 29 (52), 1970353, 2019 | 1 | 2019 |
| Superconducting Nanowire Single Photon Detector and Method of Fabrication Thereof CJ Chung, F Najafi, G Kovall, VR Manfrinato, V Kamineni, M Thompson, ... US Patent App. 16/849,829, 2020 | | 2020 |
| Tapered connectors for superconductor circuits F Najafi, VR Manfrinato WO Patent WO2020061268A1, 2020 | | 2020 |
Karl K. BerggrenProfessor of Electrical Engineering, MITVerified email at mit.edu
