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- Yoshio NishiElectrical Engineering, Stanford UniversityEmail verificata su stanford.edu
- Michael T. NicholsDirector, Etch Technology, Applied MaterialsEmail verificata su amat.com
- Harsh SinhaEmail verificata su wisc.edu
- Brian C DalyVassar CollegeEmail verificata su vassar.edu
- He RenApplied Materials, IncEmail verificata su amat.com
- Nick KellerDirector of Applications, Onto InnovationEmail verificata su ontoinnovation.com
- Sean KingPrincipal EngineerEmail verificata su intel.com
- Nerissa DraegerLam ResearchEmail verificata su lamresearch.com
- Qinghuang LinDirector, Technology Development Center, ASML USEmail verificata su asml.com
- Arto NurmikkoProfessor of Engineering and Physics, Brown UniversityEmail verificata su brown.edu
- NCM FullerIBM Research, Bell Labs and Columbia UniversityEmail verificata su us.ibm.com
- Krishna NittalaApplied MaterialsEmail verificata su ufl.edu
- Shan Chebrown universtiyEmail verificata su brown.edu
- Samer BannaTechnion, Israel Institute of Technology, Applied MaterialsEmail verificata su amat.com
- David G. CahillDepartment of Materials Science and Engineering, University of Illinois at Urbana-ChampaignEmail verificata su illinois.edu
- R. SooryakumarProfessor of Physics, Ohio State UniversityEmail verificata su osu.edu
- Jeffry KelberUniversity of North TexasEmail verificata su unt.edu
- David B. GravesProfessor of Chemical and Biological Engineering, Princeton UniversityEmail verificata su princeton.edu
- Swayambhu P Behera, PhDUniversity of North Texas, Applied MaterialsEmail verificata su my.unt.edu
- Jengyi E. YuLam ResearchEmail verificata su lamresearch.com
Segui
G. Andrew Antonelli
VP of Advanced R&D, Onto Innovation, Inc.
Email verificata su ontoinnovation.com