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Amir Tavakkoli K. G.
Amir Tavakkoli K. G.
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Year
MoS2 Field-Effect Transistor with Sub-10 nm Channel Length
A Nourbakhsh, A Zubair, RN Sajjad, A Tavakkoli KG, W Chen, S Fang, ...
Nano Letters 16 (12), 7798-7806, 2016
3582016
Templating Three-Dimensional Self-Assembled Structures in Bilayer Block Copolymer Films
AT KG, KW Gotrik, AF Hannon, A Alexander-Katz, CA Ross, KK Berggren
Science 336 (6086), 1294-1298, 2012
2732012
Multilayer block copolymer meshes by orthogonal self-assembly
AT KG, SM Nicaise, KR Gadelrab, A Alexander-Katz, CA Ross, ...
Nature Communications 7, 2016
982016
Generation of pronounced Fano resonances and tuning of subwavelength spatial light distribution in plasmonic pentamers
M Rahmani, B Lukiyanchuk, B Ng, A Tavakkoli KG, YF Liew, MH Hong
Optics express 19 (6), 4949-4956, 2011
882011
Rectangular Symmetry Morphologies in a Topographically Templated Block Copolymer
AT KG, AF Hannon, KW Gotrik, A Alexander‐Katz, CA Ross, KK Berggren
Advanced Materials, 2012
342012
Sacrificial‐Post Templating Method for Block Copolymer Self‐Assembly
A Tavakkoli KG, SM Nicaise, AF Hannon, KW Gotrik, A Alexander‐Katz, ...
Small 10 (3), 493-499, 2014
252014
Sacrificial‐Post Templating Method for Block Copolymer Self‐Assembly
A Tavakkoli KG, SM Nicaise, AF Hannon, KW Gotrik, A Alexander‐Katz, ...
Small 10 (3), 493-499, 2014
232014
Magnetostatic interaction effects in switching field distribution of conventional and staggered bit-patterned media
M Ranjbar, AT KG, SN Piramanayagam, KP Tan, R Sbiaa, SK Wong, ...
Journal of Physics D: Applied Physics 44 (26), 265005, 2011
232011
Path to achieve sub-10-nm half-pitch using electron beam lithography
A Tavakkoli KG, SN Piramanayagam, M Ranjbar, R Sbiaa, TC Chong
Journal of Vacuum Science & Technology B, Nanotechnology and …, 2011
222011
Characterization of high‐density bit‐patterned media using ultra‐high resolution magnetic force microscopy
SN Piramanayagam, M Ranjbar, R Sbiaa, A Tavakkoli KG, TC Chong
physica status solidi (RRL)–Rapid Research Letters 6 (3), 141-143, 2012
142012
Removable templates for directed self assembly
ATK Ghariehali, SM Nicaise, KK Berggren, KW Gotrik, CA Ross
US Patent 9,478,429, 2016
132016
Comparison of fine and conventional blanking based on ductile fracture criteria
FR Biglari, AT Kermani, MH Parsa, KM Nikbin, NP O’Dowd
ASME 7th Biennial Conference on Engineering Systems Design and Analysis, 265-270, 2004
122004
Serially connected monolayer MoS2FETs with channel patterned by a 7.5 nm resolution directed self-assembly lithography
A Nourbakhsh, A Zubair, A Tavakkoli, R Sajjad, X Ling, M Dresselhaus, ...
2016 IEEE Symposium on VLSI Technology, 1-2, 2016
92016
Reverse nanoimprint lithography for fabrication of nanostructures
A Tavakkoli KG, M Ranjbar, SN Piramanayagam, SK Wong, WC Poh, ...
Nanoscience and Nanotechnology Letters 4 (8), 835-838, 2012
82012
Reverse nanoimprint lithography for fabrication of nanostructures
A Tavakkoli KG, M Ranjbar, SN Piramanayagam, SK Wong, WC Poh, ...
Nanoscience and Nanotechnology Letters 4 (8), 835-838, 2012
82012
Self-assembly of block copolymers by graphoepitaxy
SM Nicaise, KGA Tavakkoli, KK Berggren
Directed Self-assembly of Block Co-polymers for Nano-manufacturing, 199-232, 2015
72015
Rapid shear alignment of sub-10 nm cylinder-forming block copolymer films based on thermal expansion mismatch
SM Nicaise, KR Gadelrab, AT KG, CA Ross, A Alexander-Katz, ...
Nano Futures 1 (3), 035006, 2018
42018
Frame curing method for extrusion control
ATK Ghariehali, MN Patel, EB Fletcher
US Patent 11,181,819, 2021
12021
System and method for illuminating edges of an imprint field with a gradient dosage
ATK Ghariehali
US Patent 10,976,657, 2021
12021
Topographic Templating: Rectangular Symmetry Morphologies in a Topographically Templated Block Copolymer (Adv. Mater. 31/2012)
A Tavakkoli KG, AF Hannon, KW Gotrik, A Alexander‐Katz, CA Ross, ...
Advanced Materials 24 (31), 4343-4343, 2012
12012
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