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Amir Tavakkoli K. G.
Amir Tavakkoli K. G.
Email verificata su ibm.com - Home page
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Citata da
Anno
MoS2 Field-Effect Transistor with Sub-10 nm Channel Length
A Nourbakhsh, A Zubair, RN Sajjad, A Tavakkoli KG, W Chen, S Fang, ...
Nano Letters 16 (12), 7798-7806, 2016
4532016
Templating Three-Dimensional Self-Assembled Structures in Bilayer Block Copolymer Films
AT KG, KW Gotrik, AF Hannon, A Alexander-Katz, CA Ross, KK Berggren
Science 336 (6086), 1294-1298, 2012
2862012
Multilayer block copolymer meshes by orthogonal self-assembly
AT KG, SM Nicaise, KR Gadelrab, A Alexander-Katz, CA Ross, ...
Nature Communications 7, 2016
1042016
Generation of pronounced Fano resonances and tuning of subwavelength spatial light distribution in plasmonic pentamers
M Rahmani, B Lukiyanchuk, B Ng, A Tavakkoli KG, YF Liew, MH Hong
Optics express 19 (6), 4949-4956, 2011
872011
Rectangular Symmetry Morphologies in a Topographically Templated Block Copolymer
AT KG, AF Hannon, KW Gotrik, A Alexander‐Katz, CA Ross, KK Berggren
Advanced Materials, 2012
34*2012
Rectangular symmetry morphologies in a topographically templated block copolymer
A Tavakkoli KG, AF Hannon, KW Gotrik, A Alexander-Katz, CA Ross, ...
Wiley Blackwell, 2012
342012
Sacrificial‐Post Templating Method for Block Copolymer Self‐Assembly
A Tavakkoli KG, SM Nicaise, AF Hannon, KW Gotrik, A Alexander‐Katz, ...
Small 10 (3), 493-499, 2014
282014
Sacrificial‐Post Templating Method for Block Copolymer Self‐Assembly
A Tavakkoli KG, SM Nicaise, AF Hannon, KW Gotrik, A Alexander‐Katz, ...
Small 10 (3), 493-499, 2014
262014
Magnetostatic interaction effects in switching field distribution of conventional and staggered bit-patterned media
M Ranjbar, AT KG, SN Piramanayagam, KP Tan, R Sbiaa, SK Wong, ...
Journal of Physics D: Applied Physics 44 (26), 265005, 2011
232011
Path to achieve sub-10-nm half-pitch using electron beam lithography
A Tavakkoli KG, SN Piramanayagam, M Ranjbar, R Sbiaa, TC Chong
Journal of Vacuum Science & Technology B 29 (1), 2011
232011
Removable templates for directed self assembly
ATK Ghariehali, SM Nicaise, KK Berggren, KW Gotrik, CA Ross
US Patent 9,478,429, 2016
142016
Characterization of high‐density bit‐patterned media using ultra‐high resolution magnetic force microscopy
SN Piramanayagam, M Ranjbar, R Sbiaa, A Tavakkoli KG, TC Chong
physica status solidi (RRL)–Rapid Research Letters 6 (3), 141-143, 2012
142012
Comparison of fine and conventional blanking based on ductile fracture criteria
FR Biglari, AT Kermani, MH Parsa, KM Nikbin, NP O’Dowd
ASME 7th Biennial Conference on Engineering Systems Design and Analysis, 265-270, 2004
132004
Serially connected monolayer MoS2FETs with channel patterned by a 7.5 nm resolution directed self-assembly lithography
A Nourbakhsh, A Zubair, A Tavakkoli, R Sajjad, X Ling, M Dresselhaus, ...
2016 IEEE Symposium on VLSI Technology, 1-2, 2016
102016
Self-assembly of block copolymers by graphoepitaxy
SM Nicaise, KGA Tavakkoli, KK Berggren
Directed Self-assembly of Block Co-polymers for Nano-manufacturing, 199-232, 2015
102015
Reverse nanoimprint lithography for fabrication of nanostructures
A Tavakkoli KG, M Ranjbar, SN Piramanayagam, SK Wong, WC Poh, ...
Nanoscience and Nanotechnology Letters 4 (8), 835-838, 2012
102012
Reverse nanoimprint lithography for fabrication of nanostructures
A Tavakkoli KG, M Ranjbar, SN Piramanayagam, SK Wong, WC Poh, ...
Nanoscience and Nanotechnology Letters 4 (8), 835-838, 2012
102012
Rapid shear alignment of sub-10 nm cylinder-forming block copolymer films based on thermal expansion mismatch
SM Nicaise, KR Gadelrab, AT KG, CA Ross, A Alexander-Katz, ...
Nano Futures 1 (3), 035006, 2018
52018
Apparatus for imprint lithography comprising a logic element configured to generate a fluid droplet pattern and a method of using such apparatus
ATK Ghariehali, EB Fletcher
US Patent App. 15/804,433, 2019
42019
System and method for illuminating edges of an imprint field with a gradient dosage
ATK Ghariehali
US Patent 10,976,657, 2021
22021
Il sistema al momento non pu eseguire l'operazione. Riprova pi tardi.
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