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Kasun Punchihewa
Kasun Punchihewa
Email verificata su intel.com
Titolo
Citata da
Citata da
Anno
Extending HKMG scaling on CMOS with FDSOI: Advantages and integration challenges
DH Triyoso, R Carter, J Kluth, K Hempel, M Gribelyuk, L Kang, A Kumar, ...
IC Design and Technology (ICICDT), 2016 International Conference on, 1-4, 2016
152016
Comparisons between Membrane, Bridge and Cantilever Miniaturized Resistive Vacuum Gauges
KG Punchihewa, E Zaker, R Kuljic, K Banerjee, T Dankovic, A Feinerman, ...
Sensors 12 (7), 8770-8781, 2012
122012
Analog, RF, and ESD device challenges and solutions for 14nm FinFET technology and beyond
J Singh, C Jerome, A Wei, R Miller, B Arnaud, C Lili, H Zang, P Kasun, ...
2014 Symposia on VLSI Technology and Circuits, 1-2, 0
12*
Extension of operating range towards lower pressures of MEMS-based thermal vacuum gauges by laser-induced heating
T Dankovic, KAG Punchihewa, E Zaker, S Farid, P Habibimehr, ...
Procedia Engineering 47, 1243-1246, 2012
92012
Factors impacting threshold voltage in Advanced CMOS integration: gate last (FINFET) vs. gate first (FDSOI)
D Triyoso, R Carter, J Kluth, S Luning, A Child, J Wahl, B Mulfinger, ...
ECS Transactions 69 (5), 103-110, 2015
52015
Factors Impacting Threshold Voltage in Advanced CMOS Integration: Gate Last (FINFET) vs. Gate First (FDSOI)
D Triyoso, R Carter, J Kluth, S Luning, A Child, J Wahl, B Mulfinger, ...
ECS Meeting Abstracts, 821, 2015
52015
Thermal-based MEMS vacuum gauges for measuring pressures from 10− 2 Torr to 10− 6 Torr
E Zaker, S Farid, SK Selvaraj, C Bhavanarayana, D Sorto, R Kaur, ...
Vacuum Nanoelectronics Conference (IVNC), 2012 25th International, 1-2, 2012
42012
Extending Advanced CMOS Scaling with SiGe Channel Materials
RJ Carter, R Sporer, DH Triyoso, A Child, GR Mulfinger, JA Wahl, ...
ECS Meeting Abstracts, 1368, 2018
32018
Extending Advanced CMOS Scaling with SiGe Channel Materials
RJ Carter, R Sporer, DH Triyoso, A Child, GR Mulfinger, JA Wahl, ...
Meeting Abstracts, 1368-1368, 2018
32018
SIMPLIFIED GATE TO SOURCE/DRAIN REGION CONNECTIONS
TG Neogi, SD Luning, D Pritchard, KA Punchihewa
US Patent App. 15/437,846, 2018
12018
Fin diode with increased junction area
KA Punchihewa, J Singh
US Patent 10,056,368, 2018
12018
Fin diode with increased junction area
KA Punchihewa, J Singh
US Patent 9,793,262, 2017
12017
Improvement of the sensitivity and operating range of MEMS-based resistive-type vacuum gauges
KG Punchihewa, E Zaker, R Kuljic, A Rangaraj, M Liu, M Purahmad, ...
Vacuum Nanoelectronics Conference (IVNC), 2011 24th International, 191-192, 2011
12011
Improvement of the sensitivity and operating range of MEMS-based resistive-type vacuum gauges
KG Punchihewa, E Zaker, R Kuljic, A Rangaraj, M Liu, M Purahmad, ...
Vacuum Nanoelectronics Conference (IVNC), 2011 24th International, 191-192, 2011
12011
Development of a Meso-scale Drift-free Pressure-sensor for Glaucoma Patients
A Duffy, K Punchihewa, A Feinerman
Journal of Undergraduate Research, 2009
12009
Contact punch through mitigation in SOI substrate
KAG Punchihewa, D Wehella-Gamage
US Patent 9,893,086, 2018
2018
Nano Fabricated 3D Extracellular Matrix (ECM) Scaffolds to alter the Cancer Cell Behavior
KAG PUNCHIHEWA
University of Illinois at Chicago, 2012
2012
3-D magnetic nanostructures
J Sautner, K Punchihewa, B Ilic, P Vavassori, A Metlushko, V Metlushko
Electromagnetics in Advanced Applications (ICEAA), 2011 International …, 2011
2011
Nano Cheese
K Gardiye Punchihewa
2011
Nano Cheese
KG Punchihewa
University of Illinois Chicago. Library., 2011
2011
Il sistema al momento non può eseguire l'operazione. Riprova più tardi.
Articoli 1–20