| Optical illumination device, exposure device and exposure method H Tanaka, O Tanitsu, M Toyoda US Patent 6,913,373, 2005 | 130 | 2005 |
| Illumination optical apparatus and exposure apparatus provided with illumination optical apparatus O Tanitsu, M Shibuya, M Toyoda US Patent App. 09/994,861, 2002 | 74 | 2002 |
| Exposure apparatus, exposure method, and method for producing device H Nishinaga, I Hikima, M Toyoda US Patent 8,305,552, 2012 | 70 | 2012 |
| Beam transforming element, illumination optical apparatus, exposure apparatus, and exposure method M Toyoda | 65 | 2015 |
| Frustration of direct photoionization of Ar clusters in intense extreme ultraviolet pulses from a free electron laser H Iwayama, K Nagaya, M Yao, H Fukuzawa, XJ Liu, G Prümper, ... Journal of Physics B: Atomic, Molecular and Optical Physics 42 (13), 134019, 2009 | 59 | 2009 |
| Exposure apparatus, exposure method, and method for producing device H Nishinaga, I Hikima, M Toyoda, M Nakagawa, T Hagiwara, Y Mizuno, ... US Patent 8,139,198, 2012 | 58 | 2012 |
| Dead-time-free ion momentum spectroscopy of multiple ionization of Xe clusters irradiated by euv free-electron laser pulses H Fukuzawa, XJ Liu, G Prümper, M Okunishi, K Shimada, K Ueda, ... Physical Review A 79 (3), 031201, 2009 | 45 | 2009 |
| Beam transforming element, illumination optical apparatus, exposure apparatus, and exposure method with two optical elements having different thicknesses M Toyoda US Patent App. 12/320,465, 2009 | 40 | 2009 |
| Optical integrator, illumination optical apparatus, exposure apparatus, and observation apparatus O Tanitsu, Y Kudo, M Toyoda, M Shibuya US Patent App. 10/734,128, 2004 | 40 | 2004 |
| Beam transforming element, illumination optical apparatus, exposure apparatus, and exposure method with two optical elements having different thicknesses M Toyoda US Patent App. 12/320,468, 2009 | 39 | 2009 |
| Beam transforming element, illumination optical apparatus, exposure apparatus, and exposure method with two optical elements having different thicknesses M Toyoda US Patent App. 12/320,480, 2009 | 39 | 2009 |
| Illumination optical apparatus, exposure apparatus and method of exposure M Toyoda, O Tanitsu, Y Takeuchi, S Hirukawa, K Suwa, T Nakashima US Patent App. 10/223,607, 2003 | 39 | 2003 |
| Diffractive optical device, refractive optical device, illumination optical system, exposure apparatus and exposure method M Toyoda, O Tanitsu US Patent 7,095,560, 2006 | 37 | 2006 |
| Beam transforming element, illumination optical apparatus, exposure apparatus, and exposure method with two optical elements having different thicknesses M Toyoda US Patent App. 12/461,852, 2009 | 35 | 2009 |
| Optical integrator, illumination optical apparatus, exposure apparatus and observation apparatus O Tanitsu, Y Kudo, M Toyoda, M Shibuya US Patent 6,741,394, 2004 | 35 | 2004 |
| High throughput and wide field of view EUV microscope for blur-free one-shot imaging of living organisms T Ejima, F Ishida, H Murata, M Toyoda, T Harada, T Tsuru, T Hatano, ... Optics Express 18 (7), 7203-7209, 2010 | 34 | 2010 |
| A soft-X-ray imaging microscope with a multilayer-coated Schwarzschild objective: Imaging tests M Toyoda, Y Shitani, M Yanagihara, T Ejima, M Yamamoto, M Watanabe Japanese Journal of Applied Physics 39 (4R), 1926, 2000 | 33 | 2000 |
| Illumination optical apparatus, exposure apparatus and method of exposure M Toyoda, O Tanitsu, Y Takeuchi, S Hirukawa, K Suwa, T Nakashima US Patent App. 10/797,132, 2004 | 32 | 2004 |
| At-wavelength extreme ultraviolet lithography mask observation using a high-magnification objective with three multilayer mirrors M Toyoda, K Yamasoe, T Hatano, M Yanagihara, A Tokimasa, T Harada, ... Applied Physics Express 5 (11), 112501, 2012 | 26 | 2012 |
| Multi-coincidence ion detection system for EUV–FEL fragmentation experiments at SPring-8 K Motomura, L Foucar, A Czasch, N Saito, O Jagutzki, H Schmidt-Böcking, ... Nuclear Instruments and Methods in Physics Research Section A: Accelerators …, 2009 | 24 | 2009 |
