| Light sources for high-volume manufacturing EUV lithography: technology, performance, and power scaling I Fomenkov, D Brandt, A Ershov, A Schafgans, Y Tao, G Vaschenko, ... Advanced Optical Technologies 6 (3-4), 173-186, 2017 | 122 | 2017 |
| Propagation of femtosecond surface plasmon polariton pulses on the surface of a nanostructured metallic film: space-time complex amplitude characterization R Rokitski, KA Tetz, Y Fainman Physical review letters 95 (17), 177401, 2005 | 71 | 2005 |
| Time-domain waveform processing by chromatic dispersion for temporal shaping of optical pulses RE Saperstein, N Alić, D Panasenko, R Rokitski, Y Fainman JOSA B 22 (11), 2427-2436, 2005 | 69 | 2005 |
| Excitation and direct imaging of surface plasmon polariton modes in a two-dimensional grating KA Tetz, R Rokitski, M Nezhad, Y Fainman Applied Physics Letters 86 (11), 2005 | 56 | 2005 |
| Performance optimization of MOPA pre-pulse LPP light source AA Schafgans, DJ Brown, IV Fomenkov, R Sandstrom, A Ershov, ... Extreme Ultraviolet (EUV) Lithography VI 9422, 56-66, 2015 | 54 | 2015 |
| Time reversal of ultrafast waveforms by wave mixing of spectrally decomposed waves D Marom, D Panasenko, R Rokitski, PC Sun, Y Fainman Optics letters 25 (2), 132-134, 2000 | 52 | 2000 |
| Industrialization of a robust EUV source for high-volume manufacturing and power scaling beyond 250W M Purvis, IV Fomenkov, AA Schafgans, M Vargas, S Rich, Y Tao, ... Extreme Ultraviolet (EUV) Lithography IX 10583, 476-485, 2018 | 44 | 2018 |
| Study of spatial–temporal characteristics of optical fiber based on ultrashort-pulse interferometry R Rokitski, PC Sun, Y Fainman Optics letters 26 (15), 1125-1127, 2001 | 28 | 2001 |
| Propagation of ultrashort pulses in multimode fiber in space and time R Rokitski, S Fainman Optics express 11 (13), 1497-1502, 2003 | 25 | 2003 |
| Surface plasmonic fields in nanophotonics Y Fainman, K Tetz, R Rokitski, LIN Pang Optics and photonics news 17 (7), 24-29, 2006 | 22 | 2006 |
| XLR 600i: recirculating ring ArF light source for double patterning immersion lithography V Fleurov, S Rokitski, R Bergstedt, H Ye, K O’Brien, R Jacques, ... Optical Microlithography XXI 6924, 618-622, 2008 | 21 | 2008 |
| Wafer-based light source parameter control I Lalovic, O Zurita, GA Rechtsteiner, P Alagna, S Hsieh, JJ Lee, R Rokitski, ... US Patent 9,715,180, 2017 | 20 | 2017 |
| Active spectral control during spectrum synthesis R Rokitski, N Seong, K O'brien US Patent 9,207,119, 2015 | 20 | 2015 |
| Scaling LPP EUV sources to meet high volume manufacturing requirements (Conference Presentation) AA Schafgans, DJ Brown, IV Fomenkov, Y Tao, M Purvis, SI Rokitski, ... Extreme Ultraviolet (EUV) Lithography VIII 10143, 330-330, 2017 | 19 | 2017 |
| XLR 500i: recirculating ring ArF light source for immersion lithography DJW Brown, P O'keeffe, VB Fleurov, R Rokitski, R Bergstedt, IV Fomenkov, ... Optical Microlithography XX 6520, 770-777, 2007 | 19 | 2007 |
| Regenerative ring resonator H Ye, RL Sandstrom, S Rokitski, DJW Brown, RJ Rafac US Patent 8,014,432, 2011 | 14 | 2011 |
| High reliability ArF light source for double patterning immersion lithography R Rokitski, T Ishihara, R Rao, R Jiang, M Haviland, T Cacouris, D Brown Optical Microlithography XXIII 7640, 657-663, 2010 | 13 | 2010 |
| Advancements in predictive plasma formation modeling MA Purvis, A Schafgans, DJW Brown, I Fomenkov, R Rafac, J Brown, ... Extreme Ultraviolet (EUV) Lithography VII 9776, 159-170, 2016 | 11 | 2016 |
| Enhancing lithography process control through advanced, on-board beam parameter metrology for wafer level monitoring of light source parameters J Choi, N Seong, O Zurita, J Thornes, Y Won, S Rokitski, Y Kang, ... Optical Microlithography XXV 8326, 882-887, 2012 | 8 | 2012 |
| Advanced light source technologies that enable high-volume manufacturing of DUV lithography extensions T Cacouris, R Rao, R Rokitski, R Jiang, J Melchior, B Burfeindt, K O'Brien Optical Microlithography XXV 8326, 499-504, 2012 | 8 | 2012 |
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