Follow
Joan K. Bosworth
Joan K. Bosworth
Unknown affiliation
Verified email at cornell.edu
Title
Cited by
Cited by
Year
Reversible morphology control in block copolymer films via solvent vapor processing: an in situ GISAXS study
MY Paik, JK Bosworth, DM Smilges, EL Schwartz, X Andre, CK Ober
Macromolecules 43 (9), 4253-4260, 2010
2002010
Control of self-assembly of lithographically patternable block copolymer films
JK Bosworth, MY Paik, R Ruiz, EL Schwartz, JQ Huang, AW Ko, ...
Acs Nano 2 (7), 1396-1402, 2008
1852008
Control of self-assembly of lithographically patternable block copolymer films
JK Bosworth, MY Paik, R Ruiz, EL Schwartz, JQ Huang, AW Ko, ...
Acs Nano 2 (7), 1396-1402, 2008
1852008
Bit patterned media based on block copolymer directed assembly with narrow magnetic switching field distribution
O Hellwig, JK Bosworth, E Dobisz, D Kercher, T Hauet, G Zeltzer, ...
Applied Physics Letters 96 (5), 2010
1602010
Virus crystals as nanocomposite scaffolds
JC Falkner, ME Turner, JK Bosworth, TJ Trentler, JE Johnson, T Lin, ...
Journal of the American Chemical Society 127 (15), 5274-5275, 2005
1282005
Directed self-assembly of POSS containing block copolymer on lithographically defined chemical template with morphology control by solvent vapor
Y Tada, H Yoshida, Y Ishida, T Hirai, JK Bosworth, E Dobisz, R Ruiz, ...
Macromolecules 45 (1), 292-304, 2012
1052012
Hydrothermal synthesis of quartz nanocrystals
JF Bertone, J Cizeron, RK Wahi, JK Bosworth, VL Colvin
Nano Letters 3 (5), 655-659, 2003
852003
Effect of structural anisotropy on the coarsening kinetics of diblock copolymer striped patterns
R Ruiz, JK Bosworth, CT Black
Physical Review B 77 (5), 054204, 2008
832008
Selective area control of self-assembled pattern architecture using a lithographically patternable block copolymer
JK Bosworth, CT Black, CK Ober
ACS nano 3 (7), 1761-1766, 2009
802009
An efficient route to mesoporous silica films with perpendicular nanochannels
S Nagarajan, M Li, RA Pai, JK Bosworth, P Busch, DM Smilgies, CK Ober, ...
Advanced Materials 20 (2), 246-251, 2008
792008
Supporting membranes on nanometer-scale self-assembled films
JK Bosworth, EA Dobisz, R Ruiz, FDR dit Rose
US Patent 8,206,601, 2012
312012
Supporting membranes on nanometer-scale self-assembled films
JK Bosworth, EA Dobisz, R Ruiz, FDR dit Rose
US Patent 8,206,601, 2012
312012
Simple fabrication of micropatterned mesoporous silica films using photoacid generators in block copolymers
S Nagarajan, JK Bosworth, CK Ober, TP Russell, JJ Watkins
Chemistry of materials 20 (3), 604-606, 2008
312008
Three-dimensional mesoporous structures fabricated by independent stacking of self-assembled films on suspended membranes
F Rose, JK Bosworth, EA Dobisz, R Ruiz
Nanotechnology 22 (3), 035603, 2010
272010
20 nm pitch directed block copolymer assembly using solvent annealing for bit patterned media
JK Bosworth, E Dobisz, R Ruiz
Journal of Photopolymer Science and Technology 23 (2), 145-148, 2010
202010
Impact of out-of-plane translational order in block copolymer lithography
JK Bosworth, EA Dobisz, O Hellwig, R Ruiz
Macromolecules 44 (23), 9196-9204, 2011
152011
Control of morphology orientation in lithographically patternable diblock copolymers
JK Bosworth, X Andre, EL Schwartz, R Ruiz, CT Black, CK Ober
Journal of Photopolymer Science and Technology 20 (4), 519-522, 2007
62007
Top-Down versus Bottom-Up Patterning of Polymers
JK Bosworth, CK Ober
Elsevier, 2012
52012
ACS Nano 2008, 2, 1396–1402 [ACS Full Text ACS Full Text]
JK Bosworth, MY Paik, R Ruiz, EL Schwartz, JQ Huang, AW Ko, ...
Google Scholar There is no corresponding record for this reference, 0
3
New self-assembly strategies for next-generation lithography
EL Schwartz, JK Bosworth, MY Paik, CK Ober
Advances in Resist Materials and Processing Technology XXVII 7639, 138-148, 2010
22010
The system can't perform the operation now. Try again later.
Articles 1–20