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Lee Myungjun
Lee Myungjun
Samsung Electronics
Geverifieerd e-mailadres voor kla-tencor.com
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Field-portable reflection and transmission microscopy based on lensless holography
M Lee, O Yaglidere, A Ozcan
Biomedical optics express 2 (9), 2721-2730, 2011
1622011
Improved slow-light delay performance of a broadband stimulated Brillouin scattering system using fiber Bragg gratings
M Lee, R Pant, MA Neifeld
Applied Optics 47 (34), 6404-6415, 2008
372008
Modern trends in imaging viii: lensfree computational microscopy tools for cell and tissue imaging at the point-of-care and in low-resource settings
SO Isikman, A Greenbaum, M Lee, W Bishara, O Mudanyali, TW Su, ...
Analytical Cellular Pathology 35 (4), 229-247, 2012
342012
Microsphere-assisted, nanospot, non-destructive metrology for semiconductor devices
S Kwon, J Park, K Kim, Y Cho, M Lee
Light: Science & Applications 11 (1), 32, 2022
322022
SBS gain-based slow-light system with a Fabry–Perot resonator
M Lee, R Pant, MD Stenner, MA Neifeld
Optics communications 281 (10), 2975-2984, 2008
192008
High-fidelity, broadband stimulated-Brillouin-scattering-based slow light using fast noise modulation
Y Zhu, M Lee, MA Neifeld, DJ Gauthier
Optics Express 19 (2), 687-697, 2011
172011
Metrology using overlay and yield critical patterns
D Kandel, MD Smith, M Wagner, E Amit, M Lee
US Patent 10,685,165, 2020
152020
Information-theoretic analysis of a stimulated-Brillouin-scattering-based slow-light system
M Lee, Y Zhu, DJ Gauthier, ME Gehm, MA Neifeld
Applied optics 50 (32), 6063-6072, 2011
132011
Information theoretic framework for the analysis of a slow-light delay device
MA Neifeld, M Lee
JOSA B 25 (12), C31-C38, 2008
122008
Toward realization of high-throughput hyperspectral imaging technique for semiconductor device metrology
C Yoon, G Park, D Han, S Im, S Jo, J Kim, W Kim, C Choi, M Lee
Journal of Micro/Nanopatterning, Materials, and Metrology 21 (2), 021209-021209, 2022
112022
Improving SEM image quality using pixel super resolution technique
M Lee, J Cantone, J Xu, L Sun, R Kim
Metrology, Inspection, and Process Control for Microlithography XXVIII 9050 …, 2014
112014
Systematic design study of an all-optical delay line based on Brillouin scattering enhanced cascade coupled ring resonators
M Lee, ME Gehm, MA Neifeld
Journal of Optics 12 (10), 104012, 2010
102010
Fourier ptychographic topography
H Wang, J Zhu, J Sung, G Hu, J Greene, Y Li, S Park, W Kim, M Lee, ...
Optics Express 31 (7), 11007-11018, 2023
92023
Distributed fiber optic intrusion detection system with improved sensitivity
M Lee, HF Taylor
Optical Fiber Sensors, WB6, 2006
82006
Lithography aware overlay metrology target design method
M Lee, MD Smith, J Lee, M Jung, H Lee, Y Kim, S Han, ME Adel, K Lee, ...
Metrology, Inspection, and Process Control for Microlithography XXX 9778, 97781L, 2016
72016
Multi spectral holographic ellipsometry for a complex 3D nanostructure
J Jung, W Kim, J Kim, S Lee, I Shin, C Yoon, S Jeong, Y Hidaka, ...
Optics Express 30 (26), 46956-46971, 2022
62022
A breakthrough on throughput and accuracy limitation in ellipsometry using self-interference holographic analysis
J Jung, Y Hidaka, J Kim, M Numata, W Kim, S Ueyama, M Lee
Metrology, Inspection, and Process Control for Semiconductor Manufacturing …, 2021
62021
System and method for fabricating metrology targets oriented with an angle rotated with respect to device features
M Lee, MD Smith
US Patent 10,018,919, 2018
62018
Metrology target design for tilted device designs
M Lee, MD Smith, ME Adel, E Amit, D Kandel
US Patent App. 15/287,388, 2017
62017
The challenges of in-fab metrology: the needs for innovative solutions
C Jun
Metrology, Inspection, and Process Control for Semiconductor Manufacturing …, 2021
52021
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Artikelen 1–20