Fuccio CRISTIANO
Fuccio CRISTIANO
LAAS-CNRS Toulouse, France
Email verificata su laas.fr
Titolo
Citata da
Citata da
Anno
Energetics of self-interstitial clusters in Si
NEB Cowern, G Mannino, PA Stolk, F Roozeboom, HGA Huizing, ...
Physical Review Letters 82 (22), 4460, 1999
3881999
Extended defects in shallow implants
A Claverie, B Colombeau, B De Mauduit, C Bonafos, X Hebras, ...
Applied Physics A 76 (7), 1025-1033, 2003
1772003
Engineering strained silicon on insulator wafers with the Smart CutTM technology
B Ghyselen, JM Hartmann, T Ernst, C Aulnette, B Osternaud, ...
Solid-state electronics 48 (8), 1285-1296, 2004
1452004
Evidence on the mechanism of boron deactivation in Ge-preamorphized ultrashallow junctions
BJ Pawlak, R Surdeanu, B Colombeau, AJ Smith, NEB Cowern, ...
Applied Physics Letters 84 (12), 2055-2057, 2004
1242004
Formation energies and relative stability of perfect and faulted dislocation loops in silicon
F Cristiano, J Grisolia, B Colombeau, M Omri, B De Mauduit, A Claverie, ...
Journal of Applied Physics 87 (12), 8420-8428, 2000
1192000
Visible photoluminescence at room temperature from microcrystalline silicon precipitates in SiO2 formed by ion implantation
T Komoda, J Kelly, F Cristiano, A Nejim, PLF Hemment, KP Homewood, ...
Nuclear Instruments and Methods in Physics Research Section B: Beamá…, 1995
1051995
Mechanisms of B deactivation control by F co-implantation
NEB Cowern, B Colombeau, J Benson, AJ Smith, W Lerch, S Paul, T Graf, ...
Applied Physics Letters 86 (10), 101905, 2005
902005
Advanced activation of ultra-shallow junctions using flash-assisted RTP
W Lerch, S Paul, J Niess, S McCoy, T Selinger, J Gelpey, F Cristiano, ...
Materials Science and Engineering: B 124, 24-31, 2005
822005
Thermal evolution of extended defects in implanted Si:: impact on dopant diffusion
A Claverie, B Colombeau, GB Assayag, C Bonafos, F Cristiano, M Omri, ...
Materials Science in Semiconductor Processing 3 (4), 269-277, 2000
812000
Clusters formation in ultralow-energy high-dose boron-implanted silicon
F Cristiano, X Hebras, N Cherkashin, A Claverie, W Lerch, S Paul
Applied physics letters 83 (26), 5407-5409, 2003
772003
A physically based model for the spatial and temporal evolution of self-interstitial agglomerates in ion-implanted silicon
CJ Ortiz, P Pichler, T FŘhner, F Cristiano, B Colombeau, NEB Cowern, ...
Journal of applied physics 96 (9), 4866-4877, 2004
722004
Kinetic aspects of the growth of platelets and voids in H implanted Si
J Grisolia, F Cristiano, GB Assayag, A Claverie
Nuclear Instruments and Methods in Physics Research Section B: Beamá…, 2001
572001
Reduced pressure chemical vapour deposition of SiGe virtual substrates for high mobility devices
JM Hartmann, Y Bogumilowicz, P Holliger, F Laugier, R Truche, ...
Semiconductor science and technology 19 (3), 311, 2003
562003
Ion beam induced defects in crystalline silicon
F Cristiano, N Cherkashin, X Hebras, P Calvo, Y Lamrani, E Scheid, ...
Nuclear Instruments and Methods in Physics Research Section B: Beamá…, 2004
552004
Direct imaging of boron segregation to extended defects in silicon
S Duguay, T Philippe, F Cristiano, D Blavette
Applied Physics Letters 97 (24), 242104, 2010
512010
Evolution of boron-interstitial clusters in crystalline Si studied by transmission electron microscopy
S Boninelli, S Mirabella, E Bruno, F Priolo, F Cristiano, A Claverie, ...
Applied Physics Letters 91 (3), 031905, 2007
452007
Deactivation of ultrashallow boron implants in preamorphized silicon after nonmelt laser annealing with multiple scans
JA Sharp, NEB Cowern, RP Webb, KJ Kirkby, D Giubertoni, S Gennaro, ...
Applied physics letters 89 (19), 192105, 2006
452006
Thermal stability of boron electrical activation in preamorphised ultra-shallow junctions
F Cristiano, N Cherkashin, P Calvo, Y Lamrani, X Hebras, A Claverie, ...
Materials Science and Engineering: B 114, 174-179, 2004
442004
Atomistic simulations of extrinsic defects evolution and transient enhanced diffusion in silicon
B Colombeau, F Cristiano, A Altibelli, C Bonafos, GB Assayag, A Claverie
Applied Physics Letters 78 (7), 940-942, 2001
422001
Optimized laser thermal annealing on germanium for high dopant activation and low leakage current
M Shayesteh, D O’Connell, F Gity, P Murphy-Armando, R Yu, K Huet, ...
IEEE Transactions on Electron Devices 61 (12), 4047-4055, 2014
402014
Il sistema al momento non pu˛ eseguire l'operazione. Riprova pi¨ tardi.
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