NbN multilayer technology on R-plane sapphire JC Villegirr, N Hadacek, S Monso, B Delnet, A Roussy, P Febvre, ... IEEE transactions on applied superconductivity 11 (1), 68-71, 2001 | 55 | 2001 |
Virtual metrology models for predicting physical measurement in semiconductor manufacturing A Ferreira, A Roussy, L Condé 2009 IEEE/SEMI Advanced Semiconductor Manufacturing Conference, 149-154, 2009 | 43 | 2009 |
Formation mechanisms of Cu (In, Ga) Se2 solar cells prepared from electrodeposited precursors F Oliva, C Broussillou, M Annibaliano, N Frederich, PP Grand, A Roussy, ... Thin Solid Films 535, 127-132, 2013 | 36 | 2013 |
Virtual metrology modeling for cvd film thickness J Besnard, D Gleispach, H Gris, A Ferreira, A Roussy, C Kernaflen, ... International Journal of Control Science and Engineering 2 (3), 26-33, 2012 | 34 | 2012 |
A structure data-driven framework for virtual metrology modeling WT Yang, J Blue, A Roussy, J Pinaton, MS Reis IEEE Transactions on Automation Science and Engineering 17 (3), 1297-1306, 2019 | 21 | 2019 |
Tool condition diagnosis with a recipe-independent hierarchical monitoring scheme J Blue, D Gleispach, A Roussy, P Scheibelhofer IEEE transactions on semiconductor manufacturing 26 (1), 82-91, 2012 | 21 | 2012 |
An interpretable unsupervised Bayesian network model for fault detection and diagnosis WT Yang, MS Reis, V Borodin, M Juge, A Roussy Control Engineering Practice 127, 105304, 2022 | 16 | 2022 |
Virtual metrology models for predicting avera PECVD oxide film thickne A Ferreira, A Roussy, C Kernaflen, D Gleispach, G Hayderer, H Gris, ... 2011 IEEE/SEMI Advanced Semiconductor Manufacturing Conference, 1-6, 2011 | 14 | 2011 |
A physics-informed Run-to-Run control framework for semiconductor manufacturing WT Yang, J Blue, A Roussy, J Pinaton, MS Reis Expert Systems with Applications 155, 113424, 2020 | 12 | 2020 |
Feedforward Run-to-Run Control for Reduced Parametric Transistor Variation in CMOS Logic 0.13 Technology N Jedidi, P Sallagoity, A Roussy, S Dauzère-Pérès IEEE transactions on semiconductor manufacturing 24 (2), 273-279, 2011 | 12 | 2011 |
Efficient FDC based on hierarchical tool condition monitoring scheme J Blue, A Roussy, A Thieullen, J Pinaton 2012 SEMI Advanced Semiconductor Manufacturing Conference, 359-364, 2012 | 11 | 2012 |
On-chip high-frequency diagnostic of RSFQ logic cells PS Febvre, JC Berthet, D Ney, A Roussy, JW Tao, G Angenieux, ... IEEE Transactions on Applied Superconductivity 11 (1), 284-287, 2001 | 9 | 2001 |
HTS pulse-stretcher and second order modulator: Design and first results A Roussy, S Karthikeyan, I Oomen, T Ortlepp, EH Sujiono, A Brinkman, ... IEEE transactions on applied superconductivity 15 (2), 457-460, 2005 | 7 | 2005 |
Virtual metrology for semiconductor manufacturing: Focus on transfer learning R Clain, V Borodin, M Juge, A Roussy 2021 IEEE 17th International conference on automation science and …, 2021 | 6 | 2021 |
A hybrid feature selection approach for virtual metrology: Application to CMP process TE KORABI, V BORODIN, J Michel, A ROUSSY 2021 32nd Annual SEMI advanced semiconductor manufacturing conference (ASMC …, 2021 | 6 | 2021 |
Virtual metrology modeling based on gaussian bayesian network WT Yang, J Blue, A Roussy, MS Reis, J Pinaton 2018 Winter Simulation Conference (WSC), 3574-3582, 2018 | 5 | 2018 |
Run-To-Run sensor variation monitoring for process fault diagnosis in semiconductor manufacturing J Blue, A Roussy, J Pinaton 2016 Winter Simulation Conference (WSC), 2523-2534, 2016 | 4 | 2016 |
Critical sensitivity of flash gate dimension spread on electrical performances for advanced embedded memory A Roussy, M Bocquet, M Bileci, S Bégouin, A Marchadier 2015 26th Annual SEMI Advanced Semiconductor Manufacturing Conference (ASMC …, 2015 | 4 | 2015 |
FDC R2R variation monitoring for sensor level diagnosis in tool condition hierarchy J Blue, A Roussy, J Pinaton 25th Annual SEMI Advanced Semiconductor Manufacturing Conference (ASMC 2014 …, 2014 | 4 | 2014 |
Implementation of MIMO R2R control regulation on furnaces processes B Richard, A Roussy, L Brun, D Pompier, C Alegret, J Pinaton 2010 IEEE/SEMI Advanced Semiconductor Manufacturing Conference (ASMC), 143-148, 2010 | 4 | 2010 |