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Andras Vladar
Andras Vladar
Affiliazione sconosciuta
Email verificata su nist.gov
Titolo
Citata da
Citata da
Anno
Metrology for the next generation of semiconductor devices
NG Orji, M Badaroglu, BM Barnes, C Beitia, BD Bunday, U Celano, ...
Nature electronics 1 (10), 532-547, 2018
3282018
Handbook of silicon semiconductor metrology
AC Diebold
CRC press, 2001
2042001
Development of the metrology and imaging of cellulose nanocrystals
MT Postek, A Vladár, J Dagata, N Farkas, B Ming, R Wagner, A Raman, ...
Measurement Science and Technology 22 (2), 024005, 2010
1842010
Correlating cellulose nanocrystal particle size and surface area
A Brinkmann, M Chen, M Couillard, ZJ Jakubek, T Leng, LJ Johnston
Langmuir 32 (24), 6105-6114, 2016
1632016
Particle size distributions by transmission electron microscopy: an interlaboratory comparison case study
SB Rice, C Chan, SC Brown, P Eschbach, L Han, DS Ensor, AB Stefaniak, ...
Metrologia 50 (6), 663, 2013
1552013
Scanning-helium-ion-beam lithography with hydrogen silsesquioxane resist
D Winston, BM Cord, B Ming, DC Bell, WF DiNatale, LA Stern, AE Vladar, ...
Journal of Vacuum Science & Technology B: Microelectronics and Nanometer …, 2009
1392009
Determination of optimal parameters for CD-SEM measurement of line-edge roughness
BD Bunday, M Bishop, DW McCormack Jr, JS Villarrubia, AE Vladar, ...
Metrology, Inspection, and Process Control for Microlithography XVIII 5375 …, 2004
1152004
Scanning electron microscope measurement of width and shape of 10 nm patterned lines using a JMONSEL-modeled library
JS Villarrubia, AE Vladár, B Ming, RJ Kline, DF Sunday, JS Chawla, S List
Ultramicroscopy 154, 15-28, 2015
1122015
Scanning electron microscope dimensional metrology using a model‐based library
JS Villarrubia, AE Vladár, MT Postek
Surface and Interface Analysis: An International Journal devoted to the …, 2005
1002005
Scanning electron microscope analog of scatterometry
JS Villarrubia, AE Vladar, JR Lowney, MT Postek Jr
Metrology, Inspection, and Process Control for Microlithography XVI 4689 …, 2002
982002
Scanning electron microscope analog of scatterometry
JS Villarrubia, AE Vladar, JR Lowney, MT Postek Jr
Metrology, Inspection, and Process Control for Microlithography XVI 4689 …, 2002
982002
Characterization of nanoparticles by scanning electron microscopy
AE Vladár, VD Hodoroaba
Characterization of nanoparticles, 7-27, 2020
962020
In-line E-beam wafer metrology and defect inspection: the end of an era for image-based critical dimensional metrology? New life for defect inspection
E Solecky, OD Patterson, A Stamper, E McLellan, R Buengener, A Vaid, ...
Metrology, Inspection, and Process Control for Microlithography XXVII 8681 …, 2013
862013
Silicon nanostructures fabricated by scanning probe oxidation and tetra-methyl ammonium hydroxide etching
FSS Chien, WF Hsieh, S Gwo, AE Vladar, JA Dagata
Journal of Applied Physics 91 (12), 10044-10050, 2002
832002
Simulation study of repeatability and bias in the CD-SEM
JS Villarrubia, AE Vladar, MT Postek
Metrology, Inspection, and Process Control for Microlithography XVII 5038 …, 2003
812003
Simulation study of repeatability and bias in the CD-SEM
JS Villarrubia, AE Vladar, MT Postek
Metrology, Inspection, and Process Control for Microlithography XVII 5038 …, 2003
812003
Simulation study of repeatability and bias in the CD-SEM
JS Villarrubia, AE Vladar, MT Postek
Metrology, Inspection, and Process Control for Microlithography XVII 5038 …, 2003
812003
Nanostructure fabrication by ultra-high-resolution environmental scanning electron microscopy
M Toth, CJ Lobo, WR Knowles, MR Phillips, MT Postek, AE Vladár
Nano letters 7 (2), 525-530, 2007
772007
Image sharpness measurement in the scanning electron microscope—Part III
NF Zhang, MT Postek, RD Larrabee, AE Vladár, WJ Keery, SN Jones
Scanning 21 (4), 246-252, 1999
771999
A kurtosis-based statistical measure for two-dimensional processes and its applications to image sharpness
NF Zhang, A Vladar, MT Postek, RD Larrabee
Nien F. Zhang, Andras Vladar, Michael T. Postek, Robert D. Larrabee, 2003
752003
Il sistema al momento non puň eseguire l'operazione. Riprova piů tardi.
Articoli 1–20