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Dmitry Rogilo
Dmitry Rogilo
Rzhanov Institute of Semiconductor Physics
Email verificata su isp.nsc.ru
Titolo
Citata da
Citata da
Anno
Critical Terrace Width for Two-Dimensional Nucleation during Si Growth on Si(111)-() Surface
DI Rogilo, LI Fedina, SS Kosolobov, BS Ranguelov, AV Latyshev
Physical Review Letters 111 (3), 036105, 2013
492013
On the role of mobile nanoclusters in 2D island nucleation on Si (111)-(7× 7) surface
DI Rogilo, LI Fedina, SS Kosolobov, AV Latyshev
Surface Science 667, 1-7, 2018
182018
2D Si island nucleation on the Si (111) surface at initial and late growth stages: On the role of step permeability in pyramidlike growth
DI Rogilo, LI Fedina, SS Kosolobov, BS Ranguelov, AV Latyshev
Journal of Crystal Growth 457, 188-195, 2017
182017
Etching of step-bunched Si (1 1 1) surface by Se molecular beam observed by in situ REM
DI Rogilo, LI Fedina, SA Ponomarev, DV Sheglov, AV Latyshev
Journal of Crystal Growth 529, 125273, 2020
152020
SiCxNyOz Coatings Enhance Endothelialization and Bactericidal activity and Reduce Blood Cell Activation
N Bhaskar, V Sulyaeva, E Gatapova, V Kaichev, D Rogilo, M Khomyakov, ...
ACS Biomaterials Science & Engineering 6 (10), 5571-5587, 2020
132020
Adatom concentration distribution on an extrawide Si (111) terrace during sublimation
DI Rogilo, NE Rybin, LI Fedina, AV Latyshev
Optoelectronics, Instrumentation and Data Processing 52, 501-507, 2016
132016
2D island nucleation controlled by nanocluster diffusion during Si and Ge epitaxy on Si (1 1 1)-(7× 7) surface at elevated temperatures
AS Petrov, DI Rogilo, DV Sheglov, AV Latyshev
Journal of Crystal Growth 531, 125347, 2020
112020
Step bunching phenomena on Si (0 0 1) surface induced by DC heating during sublimation and Si deposition
EE Rodyakina, SV Sitnikov, DI Rogilo, AV Latyshev
Journal of Crystal Growth 520, 85-88, 2019
112019
In situ reflection electron microscopy for the analysis of silicon surface processes: Sublimation, electromigration, and adsorption of impurity atoms
DI Rogilo, SV Sitnikov, EE Rodyakina, AS Petrov, SA Ponomarev, ...
Crystallography Reports 66, 570-580, 2021
92021
In situ reflection electron microscopy for investigation of surface processes on Bi2Se3 (0001)
SA Ponomarev, DI Rogilo, NN Kurus, LS Basalaeva, KA Kokh, ...
Journal of Physics: Conference Series 1984 (1), 012016, 2021
72021
Atomic structure of a single step and dynamics of Sn adatoms on the SiSn surface
RA Zhachuk, DI Rogilo, AS Petrov, DV Sheglov, AV Latyshev, S Colonna, ...
Physical Review B 104 (12), 125437, 2021
62021
Structural and morphological instabilities of the Si (1 1 1)-7× 7 surface during silicon growth and etching by oxygen and selenium
D Rogilo, S Sitnikov, S Ponomarev, D Sheglov, L Fedina, A Latyshev
Applied Surface Science 540, 148269, 2021
62021
Atomically Controlled Silicon Surface
AV Latyshev, LI Fedina, DI Rogilo, SV Sitnikov, SS Kosolobov
Novosibirsk, Parallel, 2016
62016
Formation of Two-Dimensional Islands on the Si (111) Surface during Epitaxial Growth
DI Rogilo, LI Fedina, SS Kosolobov, AV Latyshev
Vestn. NGU, Ser. Fizika 9 (2), 156-166, 2014
52014
Atomic processes on the silicon surface
AV Latyshev, LI Fedina, SS Kosolobov, SV Sitnikov, DI Rogilo, ...
Advances in Semiconductor Nanostructures, 189-221, 2017
42017
Structural transitions on Si (1 1 1) surface during Sn adsorption, electromigration, and desorption studied by in situ UHV REM
AS Petrov, DI Rogilo, RA Zhachuk, AI Vergules, DV Sheglov, AV Latyshev
Applied Surface Science 609, 155367, 2023
32023
Chemical structure and functional properties of amorphous boron carbonitride films
VS Sulyaeva, EY Gatapova, AK Kozhevnikov, DI Rogilo, AA Saraev, ...
Journal of Structural Chemistry 62, 1309-1324, 2021
32021
Thermal Hysteresis in the Resistance of In2Se3 Film on Si(111) Surface
S Ponomarev, D Rogilo, A Mironov, D Sheglov, A Latyshev
2021 IEEE 22nd International Conference of Young Professionals in Electron …, 2021
32021
From self-organization of monoatomic steps on the silicon surface to subnanometer metrology
DV Sheglov, SV Sitnikov, LI Fedina, DI Rogilo, AS Kozhukhov, ...
Optoelectronics, Instrumentation and Data Processing 56, 533-544, 2020
32020
Bottom-up generated height gauges for silicon-based nanometrology
DV Sheglov, DI Rogilo, LI Fedina, SV Sitnikov, EV Sysoev, AV Latyshev
ACS Applied Materials & Interfaces 15 (9), 12511-12523, 2023
22023
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