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Rajendra Timilsina, PhD
Rajendra Timilsina, PhD
Hitachi Energy USA
Email verificata su hitachienergy.com
Titolo
Citata da
Citata da
Anno
Strain doping: Reversible single-axis control of a complex oxide lattice via helium implantation
H Guo, S Dong, PD Rack, JD Budai, C Beekman, Z Gai, W Siemons, ...
Physical Review Letters 114 (25), 256801, 2015
872015
Fundamental resolution limits during electron-induced direct-write synthesis
G Arnold, R Timilsina, J Fowlkes, A Orthacker, G Kothleitner, PD Rack, ...
ACS applied materials & interfaces 6 (10), 7380-7387, 2014
402014
Focused helium and neon ion beam induced etching for advanced extreme ultraviolet lithography mask repair
C Gonzalez, R Timilsina, G Li, G Duscher, P Rack, W Slingenbergh, ...
journal of vaccum science and technology B 32 (2), 021602, 2014
372014
Synthesis of Nanowires via Helium and Neon Focused Ion Beam Induced Deposition with the Gas Field Ion Microscope
HM Wu, L Stern, JH Chen, M Huth, CH Schwalb, M Winhold, F Porrati, ...
Nanotechnology, 2013
312013
Monte Carlo simulations of nanoscale focused neon ion beam sputtering
R Timilsina, PD Rack
Nanotechnology 24 (49), 495303, 2013
292013
Monte Carlo simulations of nanoscale focused neon ion beam sputtering of copper: elucidating resolution limits and sub-surface damage
R Timilsina, S Tan, R Livengood, PD Rack
Nanotechnology 25 (48), 485704, 2014
282014
A comparison of neon versus helium ion beam induced deposition via Monte Carlo simulations
R Timilsina, DA Smith, PD Rack
Nanotechnology 24 (11), 115302, 2013
272013
Evaluation of mask repair strategies via focused electron, helium, and neon beam induced processing for EUV applications
CM Gonzalez, W Slingenbergh, R Timilsina, JH Noh, MG Standford, ...
SPIE Proceeding,Extreme Ultraviolet (EUV) Lithography 9048, 90480M, 2014
172014
Vacancies, microstructure and the moments of nuclear magnetic resonance: the case of hydrogenated amorphous silicon
P Biswas, R Timilsina
Journal of Physics: Condensed Matter 23 (6), 065801, 2011
152011
A study of hydrogen microstructure in amorphous silicon via inversion of nuclear magnetic resonance spectra
R Timilsina, P Biswas
Journal of Physics:Condens Matter Physics 25 (16), 165801, 2013
112013
Pulsed Laser-Assisted Focused Electron-Beam-Induced Etching of Titanium with XeF2: Enhanced Reaction Rate and Precursor Transport
JH Noh, JD Fowlkes, R Timilsina, MG Stanford, BB Lewis, PD Rack
ACS Applied Materials & Interfaces 7 (7), 4179-4184, 2015
102015
Theoretical study of hydrogen microstructure in models of hydrogenated amorphous silicon
R Timilsina, P Biswas
physica status solidi (a) 207 (3), 609-612, 2010
92010
Chaotic dynamics of a driven pendulum
R Timilsina
University of Southern Mississippi, 0
2
Monte Carlo simulations of focused ion beam induced processing
R Timilsina, PD Rack
Helium Ion Microscopy, 89-118, 2016
12016
Sensitivity Analysis of Composite Patch Design Parameters under Low Velocity Impact Loading Conditions
SC TerMaath, R Timilsina
57th AIAA/ASCE/AHS/ASC Structures, Structural Dynamics, and Materials …, 2016
12016
Voids and molecuar hydrogen in hydrogenated amorphous silicon
R Timilsina, P Biswas
APS March Meeting Abstracts 2012, B53. 014, 2012
12012
Evaluation of the effects of design uncertainty on the damage tolerance of composite patches
S TerMaath, J Retherford, E Stevens, R Timilsina
Life-Cycle of Engineering Systems:, 1899-1906, 2016
2016
\textbf {A parametric study of surface roughness and bonding mechanisms of aluminum alloys with epoxies: a molecular dynamics simulation.}
R Timilsina, S TerMaath
Bulletin of the American Physical Society 61, 2016
2016
A parametric study of surface roughness and bonding mechanisms of aluminum alloys with epoxies: a molecular dynamics simulation
R Timilsina, S Termaath
APS March Meeting Abstracts 2016, P46. 003, 2016
2016
High-Fidelity Shapes and Disruption Mechanism during Focused Electron Beam Induced Deposition
R Winkler, G Arnold, R Schmied, JD Fowlkes, A Szkudlarek, A Orthacker, ...
5th ASEM Workshop, 2015
2015
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