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Hongyu Peng
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X-ray topography characterization of gallium nitride substrates for power device development
B Raghothamachar, Y Liu, H Peng, T Ailihumaer, M Dudley, ...
Journal of Crystal Growth 544, 125709, 2020
282020
Synchrotron X-ray topography characterization of high quality ammonothermal-grown gallium nitride substrates
Y Liu, B Raghothamachar, H Peng, T Ailihumaer, M Dudley, R Collazo, ...
Journal of Crystal Growth 551, 125903, 2020
202020
Relationship between basal plane dislocation distribution and local basal plane bending in PVT-grown 4H-SiC crystals
T Ailihumaer, H Peng, B Raghothamachar, M Dudley, G Chung, ...
Journal of Electronic Materials 49 (6), 3455-3464, 2020
162020
Synchrotron X-ray topographic image contrast variation of screw-type basal plane dislocations located at different depths below the crystal surface in 4H-SiC
F Fujie, H Peng, T Ailihumaer, B Raghothamachar, M Dudley, S Harada, ...
Acta Materialia 208, 116746, 2021
142021
Dislocation contrast on X-ray topographs under weak diffraction conditions
H Peng, T Ailihumaer, Y Liu, B Raghotharmachar, X Huang, L Assoufid, ...
Journal of Applied Crystallography 54 (4), 1225-1233, 2021
132021
Influence of surface relaxation on the contrast of threading edge dislocations in synchrotron X-ray topographs under the condition of g· b= 0 and g· b× l= 0
H Peng, T Ailihumaer, F Fujie, Z Chen, B Raghothamachar, M Dudley
Journal of Applied Crystallography 54 (2), 439-443, 2021
102021
Characterization of prismatic slip in PVT-grown AlN crystals
S Hu, H Fang, Y Liu, H Peng, Q Cheng, Z Chen, R Dalmau, J Britt, ...
Journal of Crystal Growth 584, 126548, 2022
82022
Synchrotron X-Ray Topography Study on the Relationship between Local Basal Plane Bending and Basal Plane Dislocations in PVT-Grown 4H-SiC Substrate Wafers
T Ailihumaer, HY Peng, B Raghothamachar, M Dudley, G Chung, ...
Materials Science Forum 1004, 393-400, 2020
82020
Ray Tracing Simulation of Images of Dislocations and Inclusions on X-Ray Topographs of GaAs Epitaxial Wafers
H Peng, T Ailihumaer, B Raghothamachar, M Dudley
Journal of Electronic Materials 49 (6), 3472-3480, 2020
72020
Synchrotron X-ray topography studies of dislocation behavior during early stages of PVT growth of 4H-SiC crystals
T Ailihumaer, H Peng, Y Liu, B Raghothamachar, M Dudley, G Chung, ...
Journal of Electronic Materials 50, 3258-3265, 2021
62021
Analysis of dislocation contrast in synchrotron grazing-incidence x-ray topographs and ray-tracing simulation in off-axis 4h-sic crystals
T Ailihumaer, H Peng, Y Liu, Q Cheng, Z Chen, S Hu, B Raghothamachar, ...
ECS Transactions 104 (7), 157, 2021
52021
Characterization of 4H-SiC lattice damage after novel high energy ion implantation
Z Chen, Y Liu, H Peng, T Ailihumaer, Q Cheng, S Hu, B Raghothamachar, ...
ECS Transactions 104 (7), 75, 2021
52021
Surface relaxation and photoelectric absorption effects on synchrotron X-ray topographic images of dislocations lying on the basal plane in off-axis 4H-SiC crystals
T Ailihumaer, H Peng, F Fujie, B Raghothamachar, M Dudley, S Harada, ...
Materials Science and Engineering: B 271, 115281, 2021
52021
Quantitative analysis of dislocations in 4H-SiC wafers using synchrotron X-ray topography with ultra-high angular resolution
H Peng, Z Chen, Y Liu, B Raghothamachar, X Huang, L Assoufid, ...
Journal of Applied Crystallography 55 (3), 544-550, 2022
42022
Strain mapping of GaN substrates and epitaxial layers used for power electronic devices by synchrotron X-ray rocking curve topography
Y Liu, Z Chen, S Hu, H Peng, Q Cheng, B Raghothamachar, M Dudley
Journal of Crystal Growth 583, 126559, 2022
42022
Microstructure analysis of GaN epitaxial layers during ion implantation using synchrotron X-ray topography
Y Liu, H Peng, Z Chen, T Ailihumaer, Q Cheng, S Hu, B Raghothamachar, ...
ECS Transactions 104 (7), 113, 2021
42021
Characterization of Dislocations in 6H-SiC Wafer Through X-Ray Topography and Ray-Tracing Simulations
Q Cheng, T Ailihumaer, Y Liu, H Peng, Z Chen, B Raghothamachar, ...
Journal of Electronic Materials 50 (7), 4104-4117, 2021
32021
X-ray topography characterization of GaN substrates used for power electronic devices
Y Liu, H Peng, T Ailihumaer, B Raghothamachar, M Dudley
Journal of Electronic Materials 50, 2981-2989, 2021
32021
Synchrotron X-ray Topography Characterization of Commercial GaN Substrates for Power Electronic Applications
Y Liu, S Hu, H Peng, T Ailihumaer, B Raghothamachar, M Dudley
ECS Transactions 98 (6), 21, 2020
32020
In-Situ Synchrotron X-Ray Topography Study on the Stress Relaxation Process in 4H-SiC Homoepitaxial Layers
J Guo, T Ailihumaer, H Peng, B Raghothamachar, M Dudley
ECS Transactions 86 (12), 75, 2018
32018
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