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Matt Copel
Matt Copel
IBM TJ Watson Research Center
Email verificata su us.ibm.com - Home page
Titolo
Citata da
Citata da
Anno
Surfactants in epitaxial growth
M Copel, MC Reuter, E Kaxiras, RM Tromp
Physical review letters 63 (6), 632, 1989
14041989
Structure and stability of ultrathin zirconium oxide layers on Si (001)
M Copel, M Gribelyuk, E Gusev
Applied Physics Letters 76 (4), 436-438, 2000
9552000
High-mobility ultrathin semiconducting films prepared by spin coating
DB Mitzi, LL Kosbar, CE Murray, M Copel, A Afzali
Nature 428 (6980), 299-303, 2004
6292004
Ultrathin high-K metal oxides on silicon: processing, characterization and integration issues
EP Gusev, E Cartier, DA Buchanan, M Gribelyuk, M Copel, ...
Microelectronic Engineering 59 (1-4), 341-349, 2001
5432001
High-resolution depth profiling in ultrathin films on Si
EP Gusev, M Copel, E Cartier, IJR Baumvol, C Krug, MA Gribelyuk
Applied Physics Letters 76 (2), 176-178, 2000
5112000
Influence of surfactants in Ge and Si epitaxy on Si (001)
M Copel, MC Reuter, MH Von Hoegen, RM Tromp
Physical Review B 42 (18), 11682, 1990
434*1990
Atomic beam deposition of lanthanum-and yttrium-based oxide thin films for gate dielectrics
S Guha, E Cartier, MA Gribelyuk, NA Bojarczuk, MC Copel
Applied Physics Letters 77 (17), 2710-2712, 2000
4242000
Ultrathin HfO2 films grown on silicon by atomic layer deposition for advanced gate dielectrics applications
EP Gusev, C Cabral Jr, M Copel, C D’emic, M Gribelyuk
Microelectronic Engineering 69 (2-4), 145-151, 2003
3942003
Ultrathin high-K gate stacks for advanced CMOS devices
EP Gusev, DA Buchanan, E Cartier, A Kumar, D DiMaria, S Guha, ...
International Electron Devices Meeting. Technical Digest (Cat. No. 01CH37224 …, 2001
3782001
Ultrathin high-K gate stacks for advanced CMOS devices
EP Gusev, DA Buchanan, E Cartier, A Kumar, D DiMaria, S Guha, ...
International Electron Devices Meeting. Technical Digest (Cat. No. 01CH37224 …, 2001
3782001
Band alignment at the Cu2ZnSn (SxSe1− x) 4/CdS interface
R Haight, A Barkhouse, O Gunawan, B Shin, M Copel, M Hopstaken, ...
Applied Physics Letters 98 (25), 2011
3282011
Formation of a stratified lanthanum silicate dielectric by reaction with Si (001)
M Copel, E Cartier, FM Ross
Applied Physics Letters 78 (11), 1607-1609, 2001
3202001
Defect self-annihilation in surfactant-mediated epitaxial growth
M Horn-von Hoegen, FK LeGoues, M Copel, MC Reuter, RM Tromp
Physical review letters 67 (9), 1130, 1991
3111991
Microstructure and strain relief of Ge films grown layer by layer on Si (001)
FK LeGoues, M Copel, RM Tromp
Physical Review B 42 (18), 11690, 1990
2441990
Structure of Au (110) determined with medium-energy-ion scattering
M Copel, T Gustafsson
Physical review letters 57 (6), 723, 1986
1911986
Highly efficient fluorescence quenching with graphene
A Kasry, AA Ardakani, GS Tulevski, B Menges, M Copel, L Vyklicky
The Journal of Physical Chemistry C 116 (4), 2858-2862, 2012
1902012
Defects in Cu(In,Ga)Se2 Chalcopyrite Semiconductors: A Comparative Study of Material Properties, Defect States, and Photovoltaic Performance
Q Cao, O Gunawan, M Copel, KB Reuter, SJ Chey, VR Deline, DB Mitzi
Advanced Energy Materials 1 (5), 845-853, 2011
1802011
80 nm polysilicon gated n-FETs with ultra-thin Al/sub 2/O/sub 3/gate dielectric for ULSI applications
DA Buchanan, EP Gusev, E Cartier, H Okorn-Schmidt, K Rim, ...
International Electron Devices Meeting 2000. Technical Digest. IEDM (Cat. No …, 2000
1792000
Hafnium oxide gate dielectrics on sulfur-passivated germanium
MM Frank, SJ Koester, M Copel, JA Ott, VK Paruchuri, H Shang, ...
Applied physics letters 89 (11), 2006
1742006
Robustness of ultrathin aluminum oxide dielectrics on Si (001)
M Copel, E Cartier, EP Gusev, S Guha, N Bojarczuk, M Poppeller
Applied Physics Letters 78 (18), 2670-2672, 2001
1742001
Il sistema al momento non può eseguire l'operazione. Riprova più tardi.
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