Observation of self-organized filaments in a dielectric barrier discharge of Ar gas T Shirafuji, T Kitagawa, T Wakai, K Tachibana
Applied physics letters 83 (12), 2309-2311, 2003
133 2003 Effects of self-erasing discharges on the uniformity of the dielectric barrier discharge T Somekawa, T Shirafuji, O Sakai, K Tachibana, K Matsunaga
Journal of Physics D: Applied Physics 38 (12), 1910, 2005
63 2005 Measurement of SiH2 densities in an RF-discharge silane plasma used in the chemical vapor deposition of hydrogenated amorphous silicon film K Tachibana, TS Matsui
Japanese journal of applied physics 31 (8R), 2588, 1992
61 1992 Functionalization of multiwalled carbon nanotubes by solution plasma processing in ammonia aqueous solution and preparation of composite material with polyamide 6 T Shirafuji, Y Noguchi, T Yamamoto, J Hieda, N Saito, O Takai, ...
Japanese Journal of Applied Physics 52 (12R), 125101, 2013
58 2013 Plasma copolymerization of tetrafluoroethylene/hexamethyldisiloxane and in situ Fourier transform infrared spectroscopy of its gas phase TST Shirafuji, YMY Miyazaki, YNY Nakagami, YHY Hayashi, SNS Nishino
Japanese journal of applied physics 38 (7S), 4520, 1999
51 1999 Fabrication of vertically aligned diamond whiskers from highly boron-doped diamond by oxygen plasma etching C Terashima, K Arihara, S Okazaki, T Shichi, DA Tryk, T Shirafuji, N Saito, ...
ACS Applied Materials & Interfaces 3 (2), 177-182, 2011
49 2011 Underwater microdischarge in arranged microbubbles produced by electrolysis in electrolyte solution using fabric-type electrode O Sakai, M Kimura, T Shirafuji, K Tachibana
Applied Physics Letters 93 (23), 2008
47 2008 Gold nanoparticle synthesis using three-dimensionally integrated micro-solution plasmas T Shirafuji, J Ueda, A Nakamura, SP Cho, N Saito, O Takai
Japanese Journal of Applied Physics 52 (12R), 126202, 2013
34 2013 Plasma enhanced chemical vapor deposition of thermally stable and low-dielectric-constant fluorinated amorphous carbon films using low-global-warming-potential gas C5F8 T Shirafuji, A Kamisawa, T Shimasaki, Y Hayashi, S Nishino
Thin Solid Films 374 (2), 256-261, 2000
34 2000 Measurement and Calculation of SiH2 Radical Density in SiH4 and Si2H6 Plasma for the Deposition of Hydrogenated Amorphous Silicon Thin Films T Shirafuji, K Tachibana, Y Matsui
Japanese Journal of Applied Physics 34 (8R), 4239, 1995
30 1995 Heteroepitaxial growth of 3C–SiC using HMDS by atmospheric CVD Y Chen, K Matsumoto, Y Nishio, T Shirafuji, S Nishino
Materials Science and Engineering: B 61, 579-582, 1999
29 1999 PE-CVD of Fluorocarbon/SiO Composite Thin Films Using C4 F8 and HMDSO T Shirafuji, Y Miyazaki, Y Hayashi, S Nishino
Plasmas and Polymers 4, 57-75, 1999
29 1999 Solution plasma surface modification for nanocarbon-composite materials J Hieda, T Shirafuji, Y Noguchi, N Saito, O Takai
Nippon Kinzoku Gakkaishi/Journal of the Japan Institute of Metals 73 (12 …, 2009
28 2009 Submillimeter dielectric barrier discharges at atmospheric pressure: Edge effect SN Abolmasov, T Shirafuji, K Tachibana
IEEE transactions on plasma science 33 (2), 941-948, 2005
27 2005 Mechanisms of pattern formation in dielectric barrier discharges SN Abolmasov, K Tachibana, T Shirafuji
IEEE Transactions on Plasma Science 39 (11), 2090-2091, 2011
26 2011 Numerical simulation of electric double layer in contact with dielectric barrier discharge: Effects of ion transport parameters in liquid T Shirafuji, A Nakamura, F Tochikubo
Japanese Journal of Applied Physics 53 (3S2), 03DG04, 2014
24 2014 etching with perfluorobutadiene in a dual frequency plasma reactorF Fracassi, R d’Agostino, E Fornelli, F Illuzzi, T Shirafuji
Journal of Vacuum Science & Technology A: Vacuum, Surfaces, and Films 21 (3 …, 2003
22 2003 Generation of three-dimensionally integrated micro-solution plasma and its application to decomposition of methylene blue molecules in water T Shirafuji, Y Himeno
Japanese Journal of Applied Physics 52 (11S), 11NE03, 2013
21 2013 Investigations of the surface chemistry of silicon substrates etched in a rf-biased inductively coupled fluorocarbon plasma using Fourier-transform infrared ellipsometry GMW Kroesen, HJ Lee, H Moriguchi, H Motomura, T Shirafuji, ...
Journal of Vacuum Science & Technology A: Vacuum, Surfaces, and Films 16 (1 …, 1998
21 1998 Contribution of electrons, Ar (3P0, 2), H2O+, and H3O+ to production of OH (A2Σ+) in a micro-dielectric barrier discharge of Ar/H2O T Shirafuji, T Murakami
Japanese Journal of Applied Physics 54 (1S), 01AC03, 2014
19 2014