| Method of etching high aspect ratio features in a dielectric layer JM Kim, KL Doan, L Ling, J Payyapilly, D Shimuzu, SD Nemani, TB Lill US Patent App. 13/656,578, 2013 | 448 | 2013 |
| Methods for Etching Oxide Layers Using Process Gas Pulsing J Payyapilly, JM Kim, K Doan, L Ling WO Patent WO 2012/058377 A2, 2012 | 203 | 2012 |
| Plasma etch processes for boron-doped carbonaceous mask layers JM Kim, J Payyapilly, KL Doan US Patent 8,778,207, 2014 | 22 | 2014 |
| Kinetics of hydrothermally induced transformation of yttria partially stabilized zirconia JJ Payyapilly, DP Butt Journal of nuclear materials 360 (2), 92-98, 2007 | 18 | 2007 |
| Acid leaching of SHS produced magnesium oxide/titanium diboride JY Lok, KV Logan, JJ Payyapilly Journal of the American Ceramic Society 92 (1), 26-31, 2009 | 14 | 2009 |
| Plasma etch processes for opening mask layers JM Kim, JJ Payyapilly US Patent 9,305,804, 2016 | 9 | 2016 |
| Etching oxide-nitride stacks using C4F6H2 JM Kim, KL Doan, L Ling, J Payyapilly, SD Nemani, D Shimizu, Y Huang US Patent 9,748,366, 2017 | 4 | 2017 |
| Methods and apparatus for in-situ protection liners for high aspect ratio reactive ion etching D Shimizu, T Hatakeyama, S Koseki, SS Kang, JJ Payyapilly, H Watanabe US Patent 11,373,877, 2021 | 2 | 2021 |
| Formation and Growth Mechanisms of a High Temperature Interfacial Layer Between Al and TiO2 JJ Payyapilly Virginia Tech, 2008 | 1 | 2008 |
| Methods and mechanisms for adjusting process chamber parameters during substrate manufacturing C Zhang, T Zhang, J Payyapilly US Patent App. 17/557,816, 2023 | | 2023 |
| Diffusion of Aluminum into Aluminum Oxide JJ Payyapilly, KV Logan Ceramic Engineering and Science Proceedings 29 (10), 237, 2008 | | 2008 |
