| Nanopatterning Si (111) surfaces as a selective surface-chemistry route DJ Michalak, SR Amy, D Aureau, M Dai, A Estève, YJ Chabal Nature materials 9 (3), 266-271, 2010 | 148 | 2010 |
| High-resolution X-ray photoelectron spectroscopic studies of alkylated silicon (111) surfaces LJ Webb, EJ Nemanick, JS Biteen, DW Knapp, DJ Michalak, MC Traub, ... The Journal of Physical Chemistry B 109 (9), 3930-3937, 2005 | 120 | 2005 |
| Dielectric layers having ordered elongate pores DJ Michalak, RL Bristol, A Sengupta, MJ Kobrinsky US Patent App. 14/108,255, 2015 | 119 | 2015 |
| Scalable quantum circuit and control for a superconducting surface code R Versluis, S Poletto, N Khammassi, B Tarasinski, N Haider, DJ Michalak, ... Physical Review Applied 8 (3), 034021, 2017 | 113 | 2017 |
| Chemical and electrical passivation of single-crystal silicon (100) surfaces through a two-step chlorination/alkylation process EJ Nemanick, PT Hurley, LJ Webb, DW Knapp, DJ Michalak, ... The Journal of Physical Chemistry B 110 (30), 14770-14778, 2006 | 108 | 2006 |
| Transmission infrared spectroscopy of methyl-and ethyl-terminated silicon (111) surfaces LJ Webb, S Rivillon, DJ Michalak, YJ Chabal, NS Lewis The Journal of Physical Chemistry B 110 (14), 7349-7356, 2006 | 103 | 2006 |
| Chlorination of hydrogen-terminated silicon (111) surfaces S Rivillon, YJ Chabal, LJ Webb, DJ Michalak, NS Lewis, MD Halls, ... Journal of Vacuum Science & Technology A: Vacuum, Surfaces, and Films 23 (4 …, 2005 | 80 | 2005 |
| Infrared spectroscopic investigation of the reaction of hydrogen-terminated,(111)-oriented, silicon surfaces with liquid methanol DJ Michalak, S Rivillon, YJ Chabal, A Esteve, NS Lewis The Journal of Physical Chemistry B 110 (41), 20426-20434, 2006 | 75 | 2006 |
| High-resolution soft X-ray photoelectron spectroscopic studies and scanning auger microscopy studies of the air oxidation of alkylated silicon (111) surfaces LJ Webb, DJ Michalak, JS Biteen, BS Brunschwig, ASY Chan, DW Knapp, ... The Journal of Physical Chemistry B 110 (46), 23450-23459, 2006 | 64 | 2006 |
| Electrochemical and electrical behavior of (111)-oriented Si surfaces alkoxylated through oxidative activation of Si− H bonds JA Haber, I Lauermann, D Michalak, TP Vaid, NS Lewis The Journal of Physical Chemistry B 104 (43), 9947-9950, 2000 | 60 | 2000 |
| Investigation of the reactions during alkylation of chlorine-terminated silicon (111) surfaces S Rivillon Amy, DJ Michalak, YJ Chabal, L Wielunski, PT Hurley, ... The Journal of Physical Chemistry C 111 (35), 13053-13061, 2007 | 54 | 2007 |
| Defect structure and electronic properties of SiOC: H films used for back end of line dielectrics TA Pomorski, BC Bittel, PM Lenahan, E Mays, C Ege, J Bielefeld, ... Journal of Applied Physics 115 (23), 234508, 2014 | 52 | 2014 |
| Investigation of the chemical purity of silicon surfaces reacted with liquid methanol DJ Michalak, SR Amy, A Esteve, YJ Chabal The Journal of Physical Chemistry C 112 (31), 11907-11919, 2008 | 50 | 2008 |
| Porosity scaling strategies for low-k films DJ Michalak, JM Blackwell, JM Torres, A Sengupta, LE Kreno, JS Clarke, ... Journal of Materials Research 30 (22), 3363, 2015 | 46 | 2015 |
| Mechanical properties of high porosity low-k dielectric nano-films determined by Brillouin light scattering S Bailey, E Mays, DJ Michalak, R Chebiam, S King, R Sooryakumar Journal of Physics D: Applied Physics 46 (4), 045308, 2012 | 45 | 2012 |
| Effects of interfacial energetics on the effective surface recombination velocity of Si/liquid contacts F Gstrein, DJ Michalak, WJ Royea, NS Lewis The Journal of Physical Chemistry B 106 (11), 2950-2961, 2002 | 42 | 2002 |
| Surface etching, chemical modification and characterization of silicon nitride and silicon oxide—selective functionalization of Si3N4 and SiO2 LH Liu, DJ Michalak, TP Chopra, SP Pujari, W Cabrera, D Dick, JF Veyan, ... Journal of Physics: Condensed Matter 28 (9), 094014, 2016 | 33 | 2016 |
| Role of inversion layer formation in producing low effective surface recombination velocities at Si/liquid contacts WJ Royea, DJ Michalak, NS Lewis Applied Physics Letters 77 (16), 2566-2568, 2000 | 31 | 2000 |
| Metallization of fluorocarbon-based dielectric for interconnects F Gstrein, D Michalak US Patent 9,111,939, 2015 | 26 | 2015 |
| Process technology scaling in an increasingly interconnect dominated world JS Clarke, C George, C Jezewski, AM Caro, D Michalak, J Torres 2014 Symposium on VLSI Technology (VLSI-Technology): Digest of Technical …, 2014 | 26 | 2014 |
