| Proximity effect correction method for charged particle beam exposure K Takahashi US Patent 6,610,989, 2003 | 69 | 2003 |
| Proximity effect correction using pattern shape modification and area density map for electron-beam projection lithography M Osawa, K Takahashi, M Sato, H Arimoto, K Ogino, H Hoshino, ... Journal of Vacuum Science & Technology B: Microelectronics and Nanometer …, 2001 | 67 | 2001 |
| A portable load balancer for kubernetes cluster K Takahashi, K Aida, T Tanjo, J Sun Proceedings of the International Conference on High Performance Computing in …, 2018 | 36 | 2018 |
| Complementary exposure of 70 nm SoC devices in electron projection lithography H Yamashita, I Amemiya, K Takeuchi, H Masaoka, K Takahashi, A Ikeda, ... Journal of Vacuum Science & Technology B: Microelectronics and Nanometer …, 2003 | 23* | 2003 |
| Proximity effect correction using pattern shape modification and area density map K Takahashi, M Osawa, M Sato, H Arimoto, K Ogino, H Hoshino, ... Journal of Vacuum Science & Technology B: Microelectronics and Nanometer …, 2000 | 23 | 2000 |
| Complementary mask pattern split for 8 in. stencil masks in electron projection lithography H Yamashita, K Takahashi, I Amemiya, K Takeuchi, H Masaoka, ... Journal of Vacuum Science & Technology B: Microelectronics and Nanometer …, 2002 | 21 | 2002 |
| Scaled measurements of global space-charge induced image blur in electron beam projection system L Han, RF Pease, WD Meisburger, GI Winograd, K Takahashi Journal of Vacuum Science & Technology B: Microelectronics and Nanometer …, 2000 | 9 | 2000 |
| Fast and simplified technique of proximity effect correction for ultra large scale integrated circuit patterns in electron-beam projection lithography K Ogino, H Hoshino, Y Machida, M Osawa, K Takahashi, H Arimoto Japanese journal of applied physics 41 (6S), 4167, 2002 | 8* | 2002 |
| High-speed proximity effect correction system for electron-beam projection lithography by cluster processing K Ogino, H Hoshino, Y Machida, M Osawa, H Arimoto, K Takahashi, ... Japanese journal of applied physics 42 (6S), 3827, 2003 | 7 | 2003 |
| High-performance proximity effect correction for sub-70 nm design rule system on chip devices in 100 kV electron projection lithography K Ogino, H Hoshino, Y Machida, M Osawa, H Arimoto, K Takahashi, ... Journal of Vacuum Science & Technology B: Microelectronics and Nanometer …, 2003 | 6 | 2003 |
| Coulomb interaction effect correction in electron-beam block exposure lithography K Takahashi, Y Manabe, H Hoshino, Y Nara, Y Machida Japanese Journal of Applied Physics 38 (12S), 7217, 1999 | 4 | 1999 |
| A Study on Portable Load Balancer for Container Clusters K TAKAHASHI | 2 | 2019 |
| A Portable Load Balancer with ECMP Redundancy for Container Clusters K Takahashi, K Aida, T Tanjo, J Sun, K Saga IEICE TRANSACTIONS on Information and Systems 102 (5), 974-987, 2019 | 2 | 2019 |
| Defect printability analysis on electron projection lithography with diamond stencil reticle Y Tomo, Y Kojima, S Shimizu, M Watanabe, H Takenaka, H Yamashita, ... Emerging Lithographic Technologies VI 4688, 786-797, 2002 | 2 | 2002 |
| Stochastic Coulomb interaction effect in ion-neutralized electron-beam projection optics K Takahashi, L Han, RF Pease, WD Meisburger Journal of Vacuum Science & Technology B: Microelectronics and Nanometer …, 2001 | 2 | 2001 |
| Dynamic image placement accuracy of a stencil mask H Takenaka, H Yamashita, K Takahashi, Y Tomo, M Watanabe, T Iwasaki, ... Emerging Lithographic Technologies VI 4688, 559-569, 2002 | 1 | 2002 |
| Simulation of space charge neutralization using ions in electron beam projection optics K Takahashi, L Han, RF Pease, WD Meisburger Microelectronic engineering 57, 231-238, 2001 | 1 | 2001 |
| Impact of the Coulomb interaction effect on delineating densely repeated 0.1-um patterns using electron-beam block exposure K Takahashi, S Yamazaki, M Ohno, H Watanabe, T Sakakibara, M Satoh, ... Emerging Lithographic Technologies 3048, 44-53, 1997 | 1 | 1997 |
| Correcting for global space charge by positive ion generation T Crane, C Campbell, D Pickard, L Han, K Takahashi, WD Meisburger, ... Journal of Vacuum Science & Technology B: Microelectronics and Nanometer …, 2002 | | 2002 |
| Proximity effect correction for large patterns in electron-beam projection lithography M Osawa, K Takahashi, M Sato, H Arimoto, K Ogino, H Hoshino, ... Digest of Papers. Microprocesses and Nanotechnology 2001. 2001 International …, 2001 | | 2001 |
