Claudia Wiemer
Claudia Wiemer
EPFL, Stanford University, INFM, MDM, CNR
Verified email at - Homepage
Cited by
Cited by
Conductive-filament switching analysis and self-accelerated thermal dissolution model for reset in NiO-based RRAM
U Russo, D Ielmini, C Cagli, AL Lacaita, S Spiga, C Wiemer, M Perego, ...
2007 IEEE International Electron Devices Meeting, 775-778, 2007
Ozone-based atomic layer deposition of alumina from TMA: Growth, morphology, and reaction mechanism
SD Elliott, G Scarel, C Wiemer, M Fanciulli, G Pavia
Chemistry of materials 18 (16), 3764-3773, 2006
Atomic-layer deposition of
G Scarel, E Bonera, C Wiemer, G Tallarida, S Spiga, M Fanciulli, ...
Applied physics letters 85 (4), 630-632, 2004
Electronic states and mechanical properties in transition metal nitrides
F LÚvy, P Hones, PE Schmid, R SanjinÚs, M Diserens, C Wiemer
Surface and coatings technology 120, 284-290, 1999
Amorphization dynamics of films upon nano- and femtosecond laser pulse irradiation
J Siegel, W Gawelda, D Puerto, C Dorronsoro, J Solis, CN Afonso, ...
Journal of Applied Physics 103 (2), 023516, 2008
Recommended reading list of early publications on atomic layer deposition—Outcome of the “Virtual Project on the History of ALD”
E Ahvenniemi, AR Akbashev, S Ali, M Bechelany, M Berdova, S Boyadjiev, ...
Journal of Vacuum Science & Technology A: Vacuum, Surfaces, and Films 35 (1á…, 2017
Thermal characterization of the interface from room temperature up to
JL Battaglia, A Kusiak, V Schick, A Cappella, C Wiemer, M Longo, ...
Journal of Applied Physics 107 (4), 044314, 2010
Combining grazing incidence X-ray diffraction and X-ray reflectivity for the evaluation of the structural evolution of HfO2 thin films with annealing
C Wiemer, S Ferrari, M Fanciulli, G Pavia, L Lutterotti
Thin Solid Films 450 (1), 134-137, 2004
Electrical and structural characteristics of yttrium oxide films deposited by rf-magnetron sputtering on
EK Evangelou, C Wiemer, M Fanciulli, M Sethu, W Cranton
Journal of Applied Physics 94 (1), 318-325, 2003
Resistance switching in amorphous and crystalline binary oxides grown by electron beam evaporation and atomic layer deposition
S Spiga, A Lamperti, C Wiemer, M Perego, E Cianci, G Tallarida, HL Lu, ...
Microelectronic Engineering 85 (12), 2414-2419, 2008
Reproducibility in X-ray reflectometry: results from the first world-wide round-robin experiment
P Colombi, DK Agnihotri, VE Asadchikov, E Bontempi, DK Bowen, ...
Journal of Applied Crystallography 41 (1), 143-152, 2008
High Temperature Thermal Conductivity of Amorphous Al2O3 Thin Films Grown by Low Temperature ALD
A Cappella, JL Battaglia, V Schick, A Kusiak, A Lamperti, C Wiemer, ...
Advanced Engineering Materials 15 (11), 1046-1050, 2013
Thermal and electrical characterization of materials for phase-change memory cells
R Fallica, JL Battaglia, S Cocco, C Monguzzi, A Teren, C Wiemer, ...
Journal of Chemical & Engineering Data 54 (6), 1698-1701, 2009
Ru and RuO2 gate electrodes for advanced CMOS technology
K Fr÷hlich, K Husekova, D Machajdik, JC Hooker, N Perez, M Fanciulli, ...
Materials Science and Engineering: B 109 (1-3), 117-121, 2004
high- gate dielectric grown directly on by molecular-beam epitaxy
A Dimoulas, G Vellianitis, G Mavrou, G Apostolopoulos, A Travlos, ...
Applied physics letters 85 (15), 3205-3207, 2004
Hot-wire chemical vapor deposition of chalcogenide materials for phase change memory applications
A Abrutis, V Plausinaitiene, M Skapas, C Wiemer, O Salicio, A Pirovano, ...
Chemistry of Materials 20 (11), 3557-3559, 2008
Atomic layer deposition of NiO films on Si (100) using cyclopentadienyl-type compounds and ozone as precursors
HL Lu, G Scarel, C Wiemer, M Perego, S Spiga, M Fanciulli, G Pavia
Journal of The Electrochemical Society 155 (10), H807, 2008
Chlorine mobility during annealing in in and films grown by atomic layer deposition
S Ferrari, G Scarel, C Wiemer, M Fanciulli
Journal of applied physics 92 (12), 7675-7677, 2002
Effects of the oxygen precursor on the electrical and structural properties of films grown by atomic layer deposition on Ge
S Spiga, C Wiemer, G Tallarida, G Scarel, S Ferrari, G Seguini, M Fanciulli
Applied Physics Letters 87 (11), 112904, 2005
Nanoscale morphological and electrical homogeneity of and thin films studied by conducting atomic-force microscopy
S Kremmer, H Wurmbauer, C Teichert, G Tallarida, S Spiga, C Wiemer, ...
Journal of applied physics 97 (7), 074315, 2005
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