Sub-dekahertz Ultraviolet Spectroscopy of RJ Rafac, BC Young, JA Beall, WM Itano, DJ Wineland, JC Bergquist
Physical Review Letters 85 (12), 2462, 2000
428 2000 Optical frequency standards and measurements L Hollberg, CW Oates, EA Curtis, EN Ivanov, SA Diddams, T Udem, ...
IEEE Journal of Quantum Electronics 37 (12), 1502-1513, 2001
171 2001 Fast-beam laser lifetime measurements of the cesium states RJ Rafac, CE Tanner, AE Livingston, HG Berry
Physical Review A 60 (5), 3648, 1999
138 1999 Precision lifetime measurements of the 6 states in atomic cesium RJ Rafac, CE Tanner, AE Livingston, KW Kukla, HG Berry, CA Kurtz
Physical Review A 50 (3), R1976, 1994
116 1994 Stable configurations of confined cold ionic systems. R Rafac, JP Schiffer, JS Hangst, DH Dubin, DJ Wales
Proceedings of the National Academy of Sciences 88 (2), 483-486, 1991
106 1991 Measurement of the ratio of the cesium -line transition strengths RJ Rafac, CE Tanner
Physical Review A 58 (2), 1087, 1998
84 1998 Measurement of the 6 state lifetime in atomic cesium CE Tanner, AE Livingston, RJ Rafac, FG Serpa, KW Kukla, HG Berry, ...
Physical review letters 69 (19), 2765, 1992
72 1992 Measurement of the state hyperfine structure RJ Rafac, CE Tanner
Physical Review A 56 (1), 1027, 1997
58 1997 Direct comparison of two cold-atom-based optical frequency standards by using a femtosecond-laser comb KR Vogel, SA Diddams, CW Oates, EA Curtis, RJ Rafac, WM Itano, ...
Optics letters 26 (2), 102-104, 2001
54 2001 Industrialization of a robust EUV source for high-volume manufacturing and power scaling beyond 250W M Purvis, IV Fomenkov, AA Schafgans, M Vargas, S Rich, Y Tao, ...
Extreme Ultraviolet (EUV) Lithography IX 10583, 476-485, 2018
44 2018 Laser pulse shaping via extremum seeking B Ren, P Frihauf, RJ Rafac, M Krstic
Control Engineering Practice 20 (7), 674-683, 2012
42 2012 LPP EUV source readiness for NXE 3300B DC Brandt, IV Fomenkov, NR Farrar, B La Fontaine, DW Myers, DJ Brown, ...
Extreme Ultraviolet (EUV) Lithography V 9048, 69-76, 2014
38 2014 Effects of laser bandwidth on OPE in a modern lithography tool K Huggins, T Tsuyoshi, M Ong, R Rafac, C Treadway, D Choudhary, ...
Optical Microlithography XIX 6154, 351-362, 2006
35 2006 Method and apparatus for gas discharge laser output light coherency reduction RJ Rafac, ST Smith
27 2019 Relax gas discharge laser lithography light source RL Sandstrom, WN Partlo, DJW Brown, TA Yager, AI Ershov, RJ Rafac, ...
US Patent 7,088,758, 2006
27 2006 Dual-chamber ultra line-narrowed excimer light source for 193-nm lithography VB Fleurov, DJ Colon III, DJW Brown, P O'Keeffe, H Besaucele, AI Ershov, ...
Optical Microlithography XVI 5040, 1694-1703, 2003
26 2003 Hg+ optical frequency standard: recent progress BC Young, RJ Rafac, JA Beall, FC Cruz, WM Itano, DJ Wineland, ...
Laser Spectroscopy, proceedings of the XIV International Conference, 61-70, 1999
25 1999 Extreme ultraviolet light source RJ Rafac, RL Sandstrom, D Brown, KC Hou
US Patent 9,232,623, 2016
24 2016 Target for laser produced plasma extreme ultraviolet light source RJ Rafac, Y Tao
US Patent 8,872,143, 2014
24 2014 Laser produced plasma EUV sources for device development and HVM DC Brandt, IV Fomenkov, MJ Lercel, BM La Fontaine, DW Myers, ...
Extreme Ultraviolet (EUV) Lithography III 8322, 451-459, 2012
23 2012