Hyeongtag Jeon
Hyeongtag Jeon
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Citata da
Citata da
Anno
Morphology and phase stability of TiSi2 on Si
H Jeon, CA Sukow, JW Honeycutt, GA Rozgonyi, RJ Nemanich
Journal of applied physics 71 (9), 4269-4276, 1992
2581992
Apparatus for generating remote plasma
HT Jeon, IH Kim, SH Kim, CW Chung, SK Lee
US Patent App. 11/703,621, 2007
1652007
Formation of nanocrystalline Fe–Co powders produced by mechanical alloying
Y Do Kim, JY Chung, J Kim, H Jeon
Materials Science and Engineering: A 291 (1-2), 17-21, 2000
1382000
Characteristics of the ZnO thin film transistor by atomic layer deposition at various temperatures
S Kwon, S Bang, S Lee, S Jeon, W Jeong, H Kim, SC Gong, HJ Chang, ...
Semiconductor science and technology 24 (3), 035015, 2009
1312009
Apparatus for generating remote plasma
HT Jeon, S Woo, HC Kim, CW Chung
US Patent 8,207,470, 2012
1012012
Atomic layer deposition and biocompatibility of titanium nitride nano-coatings on cellulose fiber substrates
GK Hyde, SD McCullen, S Jeon, SM Stewart, H Jeon, EG Loboa, ...
Biomedical materials 4 (2), 025001, 2009
932009
Hydrogen-reduction behavior and microstructural characteristics of WO3–CuO powder mixtures with various milling time
DG Kim, ST Oh, H Jeon, CH Lee, Y Do Kim
Journal of alloys and compounds 354 (1-2), 239-242, 2003
922003
Microstructure and magnetic properties of nanosized Fe–Co alloy powders synthesized by mechanochemical and mechanical alloying process
BH Lee, BS Ahn, DG Kim, ST Oh, H Jeon, J Ahn, Y Do Kim
Materials Letters 57 (5-6), 1103-1107, 2003
862003
Characteristics of gate dielectric deposited using Zr t–butoxide and precursors by plasma enhanced atomic layer deposition method
Y Kim, J Koo, J Han, S Choi, H Jeon, CG Park
Journal of applied physics 92 (9), 5443-5447, 2002
832002
Study on the characteristics of TiN thin film deposited by the atomic layer chemical vapor deposition method
H Jeon, JW Lee, YD Kim, DS Kim, KS Yi
Journal of Vacuum Science & Technology A: Vacuum, Surfaces, and Films 18 (4…, 2000
822000
History of atomic layer deposition and its relationship with the American Vacuum Society
GN Parsons, JW Elam, SM George, S Haukka, H Jeon, WMM Kessels, ...
Journal of Vacuum Science & Technology A: Vacuum, Surfaces, and Films 31 (5…, 2013
812013
Remote plasma enhanced atomic layer deposition of TiN thin films using metalorganic precursor
JY Kim, S Seo, DY Kim, H Jeon, Y Kim
Journal of Vacuum Science & Technology A: Vacuum, Surfaces, and Films 22 (1…, 2004
762004
Photocurrent detection of chemically tuned hierarchical ZnO nanostructures grown on seed layers formed by atomic layer deposition
S Bang, S Lee, Y Ko, J Park, S Shin, H Seo, H Jeon
Nanoscale research letters 7 (1), 290, 2012
752012
Characteristics of thin films grown by plasma atomic layer deposition
J Kim, S Kim, H Jeon, MH Cho, KB Chung, C Bae
Applied Physics Letters 87 (5), 053108, 2005
752005
Ultrathin alumina-coated carbon nanotubes as an anode for high capacity Li-ion batteries
I Lahiri, SM Oh, JY Hwang, C Kang, M Choi, H Jeon, R Banerjee, YK Sun, ...
Journal of Materials Chemistry 21 (35), 13621-13626, 2011
732011
Structural and electrical properties of ZnO thin films deposited by atomic layer deposition at low temperatures
S Jeon, S Bang, S Lee, S Kwon, W Jeong, H Jeon, HJ Chang, HH Park
Journal of the Electrochemical Society 155 (10), H738, 2008
732008
A study on H2 plasma treatment effect on a-IGZO thin film transistor
J Kim, S Bang, S Lee, S Shin, J Park, H Seo, H Jeon
Journal of Materials Research 27 (17), 2318, 2012
652012
The effect of oxygen remote plasma treatment on ZnO TFTs fabricated by atomic layer deposition
S Lee, S Bang, J Park, S Park, W Jeong, H Jeon
physica status solidi (a) 207 (8), 1845-1849, 2010
652010
Characteristics of Al 2O 3 thin films deposited using dimethylaluminum isopropoxide and trimethylaluminum precursors by the plasma-enhanced atomic-layer deposition method
J Koo, S Kim, S Jeon, H Jeon, Y Kim, Y Won
Journal of the Korean Physical Society 48 (1), 131-136, 2006
652006
Tuning the electronic structure of tin sulfides grown by atomic layer deposition
G Ham, S Shin, J Park, H Choi, J Kim, YA Lee, H Seo, H Jeon
ACS Applied Materials & Interfaces 5 (18), 8889-8896, 2013
642013
Il sistema al momento non pu eseguire l'operazione. Riprova pi tardi.
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