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Marco Lisker
Marco Lisker
Email verificata su ihp-microelectronics.com
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Anno
SiGe HBT technology with fT/fmax of 300GHz/500GHz and 2.0 ps CML gate delay
B Heinemann, R Barth, D Bolze, J Drews, GG Fischer, A Fox, O Fursenko, ...
2010 International Electron Devices Meeting, 30.5. 1-30.5. 4, 2010
3042010
SiGe HBT with fx/fmax of 505 GHz/720 GHz
B Heinemann, H Rücker, R Barth, F Bärwolf, J Drews, GG Fischer, A Fox, ...
2016 IEEE International Electron Devices Meeting (IEDM), 3.1. 1-3.1. 4, 2016
2272016
Hybrid graphene/silicon Schottky photodiode with intrinsic gating effect
A Di Bartolomeo, G Luongo, F Giubileo, N Funicello, G Niu, T Schroeder, ...
2D Materials 4 (2), 025075, 2017
1372017
Dispersion engineered silicon nitride waveguides by geometrical and refractive-index optimization
JMC Boggio, D Bodenmüller, T Fremberg, R Haynes, MM Roth, ...
JOSA B 31 (11), 2846-2857, 2014
812014
Metal-free CVD graphene synthesis on 200 mm Ge/Si (001) substrates
M Lukosius, J Dabrowski, J Kitzmann, O Fursenko, F Akhtar, M Lisker, ...
ACS applied materials & interfaces 8 (49), 33786-33793, 2016
752016
Monolithically integrated 25Gbit/sec receiver for 1.55 μm in photonic BiCMOS technology
D Knoll, S Lischke, L Zimmermann, B Heinemann, D Micusik, ...
Optical Fiber Communication Conference, Th4C. 4, 2014
592014
High-performance photonic BiCMOS process for the fabrication of high-bandwidth electronic-photonic integrated circuits
D Knoll, S Lischke, R Barth, L Zimmermann, B Heinemann, H Rucker, ...
2015 IEEE International Electron Devices Meeting (IEDM), 15.6. 1-15.6. 4, 2015
502015
Frequency and risk factors associated with dry eye in patients attending a tertiary care ophthalmology center in Mexico City
JD Martinez, A Galor, N Ramos-Betancourt, A Lisker-Cervantes, F Beltrán, ...
Clinical Ophthalmology, 1335-1342, 2016
462016
SciFab–A wafer‐level heterointegrated InP DHBT/SiGe BiCMOS foundry process for mm‐wave applications
NG Weimann, D Stoppel, MI Schukfeh, M Hossain, T Al‐Sawaf, B Janke, ...
physica status solidi (a) 213 (4), 909-916, 2016
432016
Integration of SrBi2Ta2O9 thin films for high density ferroelectric random access memory
DJ Wouters, D Maes, L Goux, JG Lisoni, V Paraschiv, JA Johnson, ...
Journal of applied physics 100 (5), 2006
342006
InP-DHBT-on-BiCMOS Technology With of 400/350 GHz for Heterogeneous Integrated Millimeter-Wave Sources
T Kraemer, I Ostermay, T Jensen, TK Johansen, FJ Schmueckle, A Thies, ...
IEEE transactions on electron devices 60 (7), 2209-2216, 2013
332013
Influence of plasma treatment on SiO2/Si and Si3N4/Si substrates for large-scale transfer of graphene
R Lukose, M Lisker, F Akhtar, M Fraschke, T Grabolla, A Mai, M Lukosius
Scientific reports 11 (1), 13111, 2021
262021
Ag films grown by remote plasma enhanced atomic layer deposition on different substrates
AA Amusan, B Kalkofen, H Gargouri, K Wandel, C Pinnow, M Lisker, ...
Journal of Vacuum Science & Technology A 34 (1), 2016
262016
Iridium Thin Films Deposited by Liquid Delivery MOCVD using Ir (EtCp)(1, 5‐COD) with Toluene Solvent
Y Ritterhaus, T Hur'yeva, M Lisker, EP Burte
Chemical Vapor Deposition 13 (12), 698-704, 2007
262007
Fabrication and investigation of three-dimensional ferroelectric capacitors for the application of FeRAM
CP Yeh, M Lisker, B Kalkofen, EP Burte
AIP Advances 6 (3), 2016
252016
Effect of annealing in oxygen atmosphere on morphological and electrical properties of iridium and ruthenium thin films prepared by liquid delivery MOCVD
M Lisker, T Hur’yeva, Y Ritterhaus, EP Burte
Surface and Coatings Technology 201 (22-23), 9294-9298, 2007
252007
Liquid‐Delivery MOCVD of Strontium Bismuth Tantalate Thin Films Using Sr[Ta(OC2H5)5(OCH2CH2OCH3)]2 and Liquid Bi(CH2CH=CH2)3 as Precursors
JY Hyeon, M Lisker, M Silinskas, E Burte, FT Edelmann
Chemical Vapor Deposition 11 (4), 213-218, 2005
212005
Large-Scale Fabrication of Submicrometer-Gate-Length MOSFETs With a Trilayer PtSe2 Channel Grown by Molecular Beam Epitaxy
K Xiong, M Hilse, L Li, A Göritz, M Lisker, M Wietstruck, M Kaynak, ...
IEEE Transactions on Electron Devices 67 (3), 796-801, 2020
202020
Use of B2O3 films grown by plasma-assisted atomic layer deposition for shallow boron doping in silicon
B Kalkofen, AA Amusan, MSK Bukhari, B Garke, M Lisker, H Gargouri, ...
Journal of Vacuum Science & Technology A 33 (3), 2015
202015
Application of atomic layer deposited dopant sources for ultra‐shallow doping of silicon
B Kalkofen, AA Amusan, M Lisker, EP Burte
physica status solidi (c) 11 (1), 41-45, 2014
192014
Il sistema al momento non può eseguire l'operazione. Riprova più tardi.
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